Zobrazeno 1 - 10
of 19
pro vyhledávání: '"M M Kharkov"'
Publikováno v:
Journal of Friction and Wear. 43:423-430
Autor:
M. V. Prozhega, E. O. Rechikov, P. P. Besshapov, I. S. Babinets, S. V. Chernyshov, A. M. Stasenko, M. M. Kharkov, G. I. Rykunov, A. V. Kaziev, M. S. Kukushkina, D. V. Kolodko, T. V. Stepanova
Publikováno v:
PROCEEDINGS OF INTERNATIONAL CONFERENCE OF YOUNG SCIENTISTS AND STUDENTS “TOPICAL PROBLEMS OF MECHANICAL ENGINEERING” ToPME 2021: Mechanical Engineering Research Institute of the Russian Academy of Sciences (IMASH RAN).
Autor:
A. V. Tumarkin, Kseniya A. Leonova, Andrey V. Kaziev, D. V. Kolodko, M. M. Kharkov, D G Ageychenkov
Publikováno v:
Vacuum. 156:48-54
The magnetron discharge with uncooled Cu target has been investigated in a wide range of parameters (magnetic field, power, Ar pressure). The evolution of discharge voltage and current has been measured yielding the transition time to stable gasless
Autor:
Yu A Zemskov, Yu I Mamontov, I V Uimanov, N M Zubarev, A V Kaziev, M M Kharkov, S A Barengolts
Publikováno v:
Journal of Physics: Conference Series. 2064:012004
The investigation of the He-induced W “fuzz” electrical properties was carried out. For the research, an automated experimental setup was designed. The setup was based on a vacuum chamber operated under high vacuum conditions (~ 10−7 Pa). The v
Autor:
N S Sergeev, D G Ageychenkov, M. M. Kharkov, D. V. Kolodko, Andrey V. Kaziev, K. A. Leonova, A. V. Tumarkin
Publikováno v:
Journal of Physics: Conference Series. 2064:012061
The response of the ion current in the substrate region to the magnetic system configuration of a circular magnetron was studied during direct current sputtering of aluminum target. The unbalancing degree induced by changing of magnets’ positions w
Autor:
M M Kharkov, A R Zabirov, V V Yagov, N N Antonov, A V Tumarkin, I A Molotova, E V Terentyev, I M Molotov
Publikováno v:
Journal of Physics: Conference Series. 2039:012024
This paper contains the results of studying the surface properties before and after high-temperature oxidation. For this, the plate zirconium samples with chromium, gold and silver coatings were prepared. Cut profiles of the samples were obtained to
Publikováno v:
Surface and Coatings Technology. 293:48-54
The plasma structures in a high-current impulse magnetron discharge (HCIMD) were studied by means of a fast gated camera facing the cathode target, made from Cu, Ti, and Mo. The current–voltage characteristics of HCIMD were obtained for the range o
Autor:
D V Kolodko, Igor V. Ilychev, M. M. Kharkov, A. V. Tumarkin, G. V. Khodachenko, Andrey V. Kaziev
Publikováno v:
Surface and Coatings Technology. 293:42-47
Impulse magnetron with a liquid cathode operated in copper vapour without the working gas has been experimentally investigated. Stable discharge regimes were obtained through applying the high-current pulses over a 1.5 kW direct current magnetron dis
Autor:
Andrey V. Kaziev, E. A. Meshcheryakova, T. V. Stepanova, A. A. Pisarev, M. M. Berdnikova, M. M. Kharkov, M. Zibrov
Publikováno v:
Bulletin of the Russian Academy of Sciences: Physics. 80:175-179
Parameters of inductively coupled plasma (ICP) discharges in a mixture of gases N2, H2, and Ar at a total pressure of 1.5 × 10–3 mbar and a partial pressure ratio N2: H2: Ar = 2: 12: 1 are discussed. The plasma properties are analyzed using Langmu
Autor:
Andrey V. Kaziev, A. A. Pisarev, D V Kolodko, G. V. Khodachenko, M. M. Kharkov, A. V. Tumarkin
Publikováno v:
Physics of Atomic Nuclei. 78:1674-1676
Copper coatings were deposited on monocrystalline Si substrates using a magnetron discharge with a liquid cathode in the metal vapour plasma. During the deposition, the bias voltage in the range from 0 V to–400 V was applied to the substrate. The p