Zobrazeno 1 - 10
of 34
pro vyhledávání: '"M M Eremenko"'
Publikováno v:
Nanomaterials
Volume 11
Issue 5
Nanomaterials, Vol 11, Iss 1184, p 1184 (2021)
Volume 11
Issue 5
Nanomaterials, Vol 11, Iss 1184, p 1184 (2021)
Modern and future nanoelectronic and nanophotonic applications require precise control of the size, shape and density of III-V quantum dots in order to predefine the characteristics of devices based on them. In this paper, we propose a new approach t
Autor:
S. V. Balakirev, Oleg A. Ageev, Natalia E. Chernenko, M. S. Solodovnik, M. M. Eremenko, N. A. Shandyba, Danil V. Kirichenko
Publikováno v:
Applied Surface Science. 578:152023
In order to consider quantum dots as single objects and to use them in modern electronic and photonic devices, they must be well-isolated from each other and have an appropriate size and structural quality. This is a big challenge that is difficult t
Autor:
N A Shandyba, N E Chernenko, J Y Zhityaeva, O I Osotova, M M Eremenko, S V Balakirev, M S Solodovnik
Publikováno v:
Journal of Physics: Conference Series. 2086:012036
We present the results of studies of the effect of wet chemical treatment on the properties of a GaAs surface modified by a gallium focused ion beam. Our studies based on results of AFM, KpAFM and Raman spectroscopy measurements have shown that, duri
Publikováno v:
Journal of Physics: Conference Series. 2086:012007
In this work, we studied the effect of the deposition thickness, growth rate, arsenic flux, and implantation dose on the morphology of the GaAs nanostructures grown on modified Si areas. It is shown that an increase in the growth rate at the initial
Publikováno v:
Journal of Physics: Conference Series. 2086:012017
In this paper, we present the results of an experimental study of the influence of the ultra-low arsenic flux on the parameters of In nanodroplets obtained by droplet epitaxy on the GaAs substrate. We demonstrate that the arsenic flux can be used to
Publikováno v:
Journal of Physics: Conference Series. 2086:012005
In this paper, we present the results of kinetic Monte Carlo study of the In/GaAs growth by droplet epitaxy in conditions of non-stationary vapor supersaturation. These conditions allow achievement of the independent control of size and surface densi
Autor:
M M Eremenko, N A Shandyba, N E Chernenko, S V Balakirev, L S Nikitina, M S Solodovnik, O A Ageev
Publikováno v:
Journal of Physics: Conference Series. 2086:012027
In this work, we studied the effect of annealing the silicon surface on the morphology of focused ion beam modified areas. It was found that an increase in the ion beam accelerating voltage during surface treatment significantly affects the morpholog
Publikováno v:
Journal of Physics: Conference Series. 2086:012003
In this work, experimental studies of the influence of the arsenic molecular form (di-or tetramers) and substrate temperature on the crystallization of In/GaAs droplet nanostructures during droplet epitaxy have been carried out. We have shown the cri
Publikováno v:
Nanotechnology. 30(50)
Fabrication of AIIIBV nanostructures by droplet epitaxy has many advantages over other epitaxial techniques. Although various characteristics of the growth by droplet epitaxy have been thoroughly studied for both lattice-matched and mismatched system
Publikováno v:
Journal of Crystal Growth. 457:46-51
The molecular beam epitaxial growth of GaAs on the GaAs(001)-(2×4) surface is investigated using a kinetic Monte Carlo-based method. The developed algorithm permits to focus on the kinetic effects in a wide range of growth conditions and enables con