The 2022 Plasma Roadmap: low temperature plasma science and technology

Autor: I Adamovich, S Agarwal, E Ahedo, L L Alves, S Baalrud, N Babaeva, A Bogaerts, A Bourdon, P J Bruggeman, C Canal, E H Choi, S Coulombe, Z Donkó, D B Graves, S Hamaguchi, D Hegemann, M Hori, H-H Kim, G M W Kroesen, M J Kushner, A Laricchiuta, X Li, T E Magin, S Mededovic Thagard, V Miller, A B Murphy, G S Oehrlein, N Puac, R M Sankaran, S Samukawa, M Shiratani, M Šimek, N Tarasenko, K Terashima, E Thomas Jr, J Trieschmann, S Tsikata, M M Turner, I J van der Walt, M C M van de Sanden, T von Woedtke

Publikováno v: Journal of Physics D: Applied Physics, 55(37):373001. Institute of Physics
Journal of Physics D: Applied Physics, 55, 373001
Journal of physics: D: applied physics
e-Archivo. Repositorio Institucional de la Universidad Carlos III de Madrid
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Journal of Physics D: Applied Physics

Documento escrito por un elevado número de autores/as, solo se referencia el/la que aparece en primer lugar y los/as autores/as pertenecientes a la UC3M. The 2022 Roadmap is the next update in the series of Plasma Roadmaps published by Journal of Ph

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1dfd5070a5f1f5999500e993944ce9a7
https://hdl.handle.net/2117/376648

Voltage Waveform Tailoring in Plasma Etching of Dielectrics to Mitigate Surface Charging Effects

Autor: F. Kruger, M. J. Kushner, H. Lee, S. K. Nam

Publikováno v: 2022 IEEE International Conference on Plasma Science (ICOPS).

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4346b817f216f17626bee9d8c3edee5f
https://doi.org/10.1109/icops45751.2022.9813200

Production of Methyl Radicals in Atmospheric Pressure Microreactors for Up-Conversion to High Values Hydrocarbons

Autor: S. Kerketta, K. Wolf, R. Hartman, M. J. Kushner

Publikováno v: 2022 IEEE International Conference on Plasma Science (ICOPS).

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::042edcba55a7c89bdd1c4b1c781a3f76
https://doi.org/10.1109/icops45751.2022.9813290

A Volumetric Measurement on Fields and Densities in an Inductively Coupled AR/O2 Plasma - Experiment

Autor: Y. Qian, W. Gekelman, P. Pribyl, A. Paterson, T. Piskin, M. J. Kushner

Publikováno v: 2022 IEEE International Conference on Plasma Science (ICOPS).

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3592887e1b2e9e23174e4f2d024c5fc2
https://doi.org/10.1109/icops45751.2022.9813002

Lif Measurement of the Ion Angular Distribution Near Abiased Wafer-Experiment

Autor: W. Gekelman, P. Pribyl, Y. Qian, A. Paterson, T. Piskin, M. J. Kushner

Publikováno v: 2022 IEEE International Conference on Plasma Science (ICOPS).

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8b77d503c7f659d10d545068d312f169
https://doi.org/10.1109/icops45751.2022.9813151