Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Mårten Rooth"'
Publikováno v:
International Journal of Pharmaceutics. 529:116-122
Atomic layer deposition (ALD) enables deposition of dense nanometer thick metal oxide nanoshells on powder particles with precise thickness control. This leads to products with low weight fraction coating, also when depositing on nano- or micron size
Autor:
A. Ringbom, Steven R Biegalski, F. Nielsen, Mårten Rooth, Adam Johannes Johansson, T. Fritioff, A. G. Fay, Indrek Jõgi, Mats Boman, K. Elmgren, Henrik Sjöstrand, Lisa Blackberg, L. Mårtensson, Mattias Klintenberg
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 656:84-91
In this work Al2O3 and SiO2 coatings are tested as Xe diffusion barriers on plastic scintillator substrates. The motivation is improved beta–gamma coincidence detection systems, used to measure atmospheric radioxenon within the verification regime
Autor:
Torbjörn Gustafsson, Mattis Fondell, Jun Lu, Seng Kian Cheah, Mats Boman, Leif Nyholm, Anders Hårsta, Emilie Perre, Patrice Simon, Kristina Edström, Mårten Rooth
Publikováno v:
Nano Letters. 9:3230-3233
A nanostructured three-dimensional (3D) microbattery has been produced and cycled in a Li-ion battery. It consists of a current collector of aluminum nanorods, a uniform layer of 17 nm TiO(2) covering the nanorods made using ALD, an electrolyte and m
Autor:
Ronald A. Quinlan, Brian C. Holloway, Anders Hårsta, Helena Grennberg, Mårten Rooth, Jun Lu, Erika Widenkvist, Ulf Jansson
Publikováno v:
Journal of Crystal Growth. 311:373-377
Thin films of cobalt oxide, iron oxide and niobium oxide, and nanostructured thin films of iron oxide, titanium oxide and multilayered iron oxide/titanium oxide have been deposited by Atomic Layer Deposition (ALD). The metal oxides were grown using t
Publikováno v:
Key Engineering Materials. :689-692
A non-bioactive implant device can easily be changed to in vitro bioactive with a thin coating of crystalline TiO2. This crystalline coating can be deposited very thin with great step coverage at a low temperature with Atomic Layer Deposition (ALD).
Publikováno v:
Chemical Vapor Deposition. 12:209-213
Thin films of cobalt oxide, iron oxide and niobium oxide, and nanostructured thin films of iron oxide, titanium oxide and multilayered iron oxide/titanium oxide have been deposited by Atomic Layer Deposition (ALD). The metal oxides were grown using t
Publikováno v:
MRS Proceedings. 901
Amorphous niobium oxide (Nb2O5) nano-tubes were fabricated inside anodic alumina templates using atomic layer deposition (ALD). The nanoporous templates were in-house fabricated anodic alumina membranes having an inter-pore distance of about 100 nm w
Autor:
Mårten Rooth, Jun Lu, Mats Boman, Inna Soroka, Jan-Otto Carlsson, Peter Svedlindh, Anders Hårsta
Publikováno v:
Journal of Applied Physics. 106:084313
Double- and triple-walled TiO2/iron oxide nanotubes with well defined interfaces have been produced in nanoporous alumina templates using atomic layer deposition method. The structural properties of each individual layer are found to be dependent on
Publikováno v:
Journal of Applied Physics. 101:124105
Hafnium oxide films with a measured relative dielectric constant of 15.4 were deposited at room temperature on Si and 4H-SiC substrates, as well as on 4H-SiC p-i-n diodes. An 8 nm thick SiO2 interfacial layer on SiC increased the breakdown field of t
Autor:
Luis Bailón, Salvador Dueñas, Mårten Rooth, Héctor García, Anders Hårsta, Kaupo Kukli, Markku Leskelä, Helena Castán, Mikko Ritala, Ola Wilhelmsson
Publikováno v:
Journal of Applied Physics. 100:094107
This work examines the structural and electrical properties of HfSixOy film based metal-insulator-semiconductor capacitors by means of x-ray diffraction, x-ray photoelectron spectroscopy, capacitance-voltage (C-V), deep level transient spectroscopy,