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pro vyhledávání: '"Lynne Koker"'
Publikováno v:
physica status solidi (a). 197:117-122
Laser assisted etching of n-type silicon, without an applied potential, to form porous silicon has been studied in a variety of etchants. The range of pore diameters correlates with the ratio of the activities of HF and HF - 2 . Where the activity ra
Publikováno v:
The Journal of Physical Chemistry B. 106:4424-4431
Photoluminescent porous silicon has been produced in a variety of etchants using laser-assisted etching of silicon without an applied potential. Porous silicon (por-Si) produced from etchants containing K+, Cs+, or Rb+ can have cubic crystallites of
Autor:
Lynne Koker, Kurt W. Kolasinski
Publikováno v:
The Journal of Physical Chemistry B. 105:3864-3871
The formation rate of porous silicon by photoelectrochemical etching of n-type silicon is measured in situ by a novel technique. The reflection of the laser beam used to drive the reaction contains...
Autor:
Lynne Koker, Kurt W. Kolasinski
Publikováno v:
Physical Chemistry Chemical Physics. 2:277-281
The irradiation of n-type Si(111) submerged in HF(aq) with a UV, visible or IR laser can lead to the formation of photoluminescent porous silicon (por-Si) thin films. We demonstrate that two distinct photoelectrochemical etching processes are induced
Autor:
Kurt W. Kolasinski, Lynne Koker
Publikováno v:
Materials Science and Engineering: B. :132-135
The rate of formation of photochemical porous silicon is measured in situ by studying the rate of increase in the radius of the circular interference patterns contained in the reflected laser beam. This technique is used to study the effects on etch
Autor:
Lynne Koker, Kurt W. Kolasinski
Publikováno v:
Journal of Applied Physics. 86:1800-1807
A HeNe laser has been used to fabricate photochemically a photoluminescent porous Si thin film on top of crystalline Si. The porous Si film has Gaussian shaped upper and lower interfaces. When the reflection of a laser beam from this film during, or
Publikováno v:
ResearcherID
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Publikováno v:
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We have used a variety of laser wavelengths (365, 473, 633, 685, 730 nm) to produced porous silicon thin films by photochemically etching n-type Si in 48% HF in aqueous solution. Photoluminescence (PL) has been excited either with 365 or 473 nm light
Externí odkaz:
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Autor:
A. Wellner, J. C. Barnard, Richard E. Palmer, Kurt W. Kolasinski, Lynne Koker, Paul A. Hamley, Santanu Ganguly, Christian N. Field, Martyn Poliakoff, Mark Aindow
Publikováno v:
Scopus-Elsevier
Porous silicon thin films created under laser illumination in fluoride solutions without biasing have been studied by a variety of techniques to investigate the film structure and photoluminescence (PL). The use of ultrathin silicon wafers allows us
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