A statistical method to optimize the chemical etching process of zinc oxide thin films.

Autor: Lynes DD; Department of Electrical and Computer Engineering, Air Force Institute of Technology, Wright-Patterson Air Force Base, OH 45433, USA., Chandrahalim H; Department of Electrical and Computer Engineering, Air Force Institute of Technology, Wright-Patterson Air Force Base, OH 45433, USA., Brown JM; Department of Electrical and Computer Engineering, Air Force Institute of Technology, Wright-Patterson Air Force Base, OH 45433, USA., Singh K; Department of Electrical and Computer Engineering, Air Force Institute of Technology, Wright-Patterson Air Force Base, OH 45433, USA., Bodily KT; Department of Electrical and Computer Engineering, Air Force Institute of Technology, Wright-Patterson Air Force Base, OH 45433, USA., Leedy KD; Sensors Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, OH 45433, USA.

Publikováno v: Royal Society open science [R Soc Open Sci] 2022 Aug 03; Vol. 9 (8), pp. 211560. Date of Electronic Publication: 2022 Aug 03 (Print Publication: 2022).