Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Lutz Wilde"'
Publikováno v:
Digital.CSIC. Repositorio Institucional del CSIC
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[EN] High electron mobility III-V semiconductors like InGaAs are excellent candidates for sub-10 nm n-metal-oxide-semiconductor (nMOS) devices. One of the critical challenges in downscaling III-V devices is achieving low-resistance contacts by formin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9f17347d4f2a9d7b37c2d0ae84385e03
http://hdl.handle.net/10261/215456
http://hdl.handle.net/10261/215456
Autor:
Günther Benstetter, Lutz Wilde, Mario Lanza, Paweł Piotr Michałowski, Montserrat Nafria, Edgar Lodermeier, Marc Porti, Gert Jaschke, Xavier Aymerich, Heiko Ranzinger, S. Teichert
Publikováno v:
IEEE Transactions on Nanotechnology. 10:344-351
In this paper, atomic force microscopy-based techniques have been used to study, at nanoscale, the dependence of the electrical properties of Al2O3 stacks for flash memories on the annealing temperature (TA). The electrical characterization has been
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b85783256dadd12b058fc2235cf03f3a
https://doi.org/10.1109/tnano.2010.2041935
https://doi.org/10.1109/tnano.2010.2041935
Autor:
Rolf Stephan, Lutz Wilde, M. Weisheit, Lutz Herrmann, Alexander Wuerfel, Walter Hansch, Torben Kelwing, Hartmut Prinz, Bernhard Trui, Christoph Klein, Inka Richter, Rick Carter, Peter Kücher, S. Mutas, Falk Graetsch, Martin Trentzsch, Susanne Ohsiek, Anita Peeva, Andreas Naumann
Publikováno v:
ECS Transactions. 33:3-14
Future scaling of complementary metal oxide semiconductor (CMOS) technology requires high-k (HK) dielectrics with metal gate (MG) electrodes to realize higher gate capacitances and low gate leakage currents [1]. During the last decade the semiconduct
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f183ab8e314b3efbdf19c02cd2021381
https://doi.org/10.1149/1.3481586
https://doi.org/10.1149/1.3481586
Autor:
Johann W. Bartha, Lutz Wilde, M. Rose, Ingolf Endler, Jaakko Niinistö, Paweł Piotr Michałowski, Lukas Gerlich
Publikováno v:
The Journal of Physical Chemistry C. 113:21825-21830
The thermal atomic layer deposition of TiO2 from Cp*Ti(OMe)3 and ozone was studied in a 300 mm wafer reactor by quadrupole mass spectrometry (QMS). The deposited thin films were analyzed by X-ray reflectivity (XRR), X-ray photoelectron spectroscopy (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f69e7bc595e133dcce320d38395ecea0
https://doi.org/10.1021/jp907940u
https://doi.org/10.1021/jp907940u
Autor:
Michael Sittig, Lutz Wilde
Alltagsprobleme schnell gelöst. Hier geht's um die wirklich kniffligen Fragen im Leben: Wie wechsele ich die Steuerklasse? Wie den Stromanbieter? Wie beantrage ich einen Erbschein? Wie widerrufe ich einen Einkauf, sodass es später keinen Ärger gib
Publikováno v:
Journal of Materials Chemistry. 10:2368-2374
The structural transformation of various vanadyl(IV) phosphates into vanadium oxide-containing crystalline (NH4)2(VO)3(P2O7)2 in the presence of ammonia-containing gas flows and under ammoxidation of toluene reaction conditions has been investigated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a183a0f8a3f74f68ce3985a3ba930537
https://doi.org/10.1039/b003318i
https://doi.org/10.1039/b003318i
Publikováno v:
Zeitschrift für anorganische und allgemeine Chemie. 630:983-985
Synthesis and Crystal Structure of Vanadium(III) Borophosphate, V2[B(PO4)3] By reaction of boron phosphate, BPO4, and vanadium(IV)-oxide, VO2, at 1050 °C a hitherto unknown vanadium(III)-borophosphate is formed. Its composition was found to be V2BP3
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3df57aeb55086abde6ae25573d8b879e
https://doi.org/10.1002/zaac.200400102
https://doi.org/10.1002/zaac.200400102
Publikováno v:
ChemInform. 35
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d30a92b532ef1625b83fd9c9bd087707
https://doi.org/10.1002/chin.200438027
https://doi.org/10.1002/chin.200438027
1971 erschien erstmals ein Band Hamburg und Schleswig-Holstein. Bearbeiter war Johannes Habich, später Landeskonservator in Kiel (1985–1998), dessen fundierte Beschreibung der hiesigen Kunstdenkmäler und deren Einordnung in die größeren Zusamme
Autor:
Torben Kelwing, Andreas Naumann, Martin Trentzsch, Sergej Mutas, Bernhard Trui, Lutz Herrmann, Falk Graetsch, Christoph Klein, Lutz Wilde, Susanne Ohsiek, Martin Weisheit, Anita Peeva, Inka Richter, Hartmut Prinz, Alexander Wuerfel, Rick Carter, Rolf Stephan, Peter Kücher, Walter Hansch
Publikováno v:
ECS Meeting Abstracts. :1484-1484
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e35f8de1f6cf690b1dbdaa59ca2037d3
https://doi.org/10.1149/ma2010-02/22/1484
https://doi.org/10.1149/ma2010-02/22/1484