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of 38
pro vyhledávání: '"Lutz Aschke"'
Autor:
Lutz Aschke
Publikováno v:
PhotonicsViews. 18:1-1
Publikováno v:
SPIE Proceedings.
Publikováno v:
SPIE Proceedings.
Autor:
Alexei Krasnaberski, Mikhail Ivanenko, Lutz Aschke, Vitalij Lissotschenko, Wyacheslav Grimm, Lisa Kleinschmidt
Publikováno v:
SPIE Proceedings.
Ultra-narrow line-shaped laser focuses are required for different material surface applications. We review the development of line-shaping optics for green DPSS lasers and report exemplary on several systems providing different line geometries and us
Autor:
Ansgar Teipel, Lutz Aschke
Publikováno v:
SPIE Proceedings.
Enabling the next technology nodes with optical technologies means further reduced error budgets for optical systems and new optical approaches for higher precision and increased throughput. This contribution discusses important aspects and features
Autor:
Mikhail Ivanenko, A. Krasnaberski, Lutz Aschke, Alexei Mikhailov, Vitalij Lissotschenko, Waleri Imgrunt, Yu. V. Miklyaev
Publikováno v:
SPIE Proceedings.
Diffractive optical elements (DOE) play an important role for laser beam shaping in industry, for example in lithography or parallel laser material processing. Typically such applications require high damage threshold and low background illumination
Autor:
Lutz Aschke, Mikhail Ivanenko, Vitalij Lissotschenko, Yuri V. Miklyaev, Alexei Mikhailov, A. Krasnaberski
Publikováno v:
SPIE Proceedings.
A new type of low-voltage planar electro-optical device for fast beam deflection is reported. It contains two EO modulators, both working as multimode waveguides. The geometry of the waveguides (ratio height to length) enables an efficient self-imagi
Publikováno v:
SPIE Proceedings.
Micro-lenses and micro-lens arrays are widely used for various applications. Monolithic arrays of cylindrical lenslets made of glass, semiconductors or crystals provide great advantages to laser applications, e.g. high efficiency, intensity stability
Autor:
Maxim V. Bolshakov, Waleri Imgrunt, Lutz Aschke, Victor A. Soifer, Vladimir S. Pavelyev, Yuri V. Miklyaev, Denis G. Kachalov, Vitaly Lissotschenko
Optical lithography with its 193nm technology is pushed to reach and shift its limits even further. There is strong demand on innovations in illumination part of exposure tools. Current illumination systems consisting of diffractive and refractive op
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f838611a82873ec36044bd5dea6b2808
http://dspace.susu.ru/handle/0001.74/20499
http://dspace.susu.ru/handle/0001.74/20499
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
LIMO's unique production technology based on computer-aided design enables the manufacture of high precision asphere single lenses and arrays, where every single lens can be individually shaped. These free form micro-optical cylindrical lens and lens