Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Luong, Kim Vu"'
Autor:
Philipsen, Vicky, Luong, Kim Vu, Opsomer, Karl, Detavernier, Christophe, Hendrickx, Eric, Erdmann, Andreas, Evanschitzky, Peter, Van De Kruijs, Robbert W.E., Heidarnia-Fathabad, Zahra, Scholze, Frank, Laubis, Christian, Gallagher, Emily E., Rankin, Jed H.
Publikováno v:
Photomask Technology 2018, 10810
In next-generation EUV imaging for foundry N5 dimensions and beyond, inherent pitch- and orientation-dependent effects on wafer level will consume a significant part of the lithography budget using the current Ta-based mask. Mask absorber optimizatio
Autor:
Ando, Akihiko, Philipsen, Vicky, Luong, Kim Vu, Opsomer, Karl, Souriau, Laurent, Rip, Jens, Detavernier, Christophe, Erdmann, Andreas, Evanschitzky, Peter, Laubis, Christian, Hönicke, Philipp, Soltwisch, Victor, Hendrickx, Eric
Publikováno v:
Proceedings of SPIE; June 2019, Vol. 11178 Issue: 1 p111780F-111780F-7, 1006028p
Autor:
Gallagher, Emily E., Rankin, Jed H., Philipsen, Vicky, Luong, Kim Vu, Opsomer, Karl, Detavernier, Christophe, Hendrickx, Eric, Erdmann, Andreas, Evanschitzky, Peter, van de Kruijs, Robbert W. E., Heidarnia-Fathabad, Zahra, Scholze, Frank, Laubis, Christian
Publikováno v:
Proceedings of SPIE; October 2018, Vol. 10810 Issue: 1 p108100C-108100C-13, 10701914p
Autor:
Behringer, Uwe F.W., Finders, Jo, Scholze, Frank, Laubis, Christian, Luong, Kim Vu, Philipsen, Vicky
Publikováno v:
Proceedings of SPIE; June 2017, Vol. 10446 Issue: 1 p1044609-1044609-12
Autor:
Panning, Eric M., Goldberg, Kenneth A., Philipsen, Vicky, Luong, Kim Vu, Souriau, Laurent, Hendrickx, Eric, Erdmann, Andreas, Xu, Dongbo, Evanschitzky, Peter, van de Kruijs, Robbert W. E., Edrisi, Arash, Scholze, Frank, Laubis, Christian, Irmscher, Mathias, Naasz, Sandra, Reuter, Christian
Publikováno v:
Proceedings of SPIE; April 2017, Vol. 10143 Issue: 1 p1014310-1014310-15