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Publikováno v:
Proceedings of SPIE; October 2022, Vol. 12287 Issue: 1 p122871J-122871J-6, 1105846p
Autor:
Luo Jinsheng1 jslaw73@hotmail.com
Publikováno v:
Petroleum - Gas University of Ploiesti Bulletin, Educational Sciences Series. 2010, Vol. 62 Issue 1B, p57-65. 9p.
Publikováno v:
Solid-State Electronics. 42:458-462
In this paper, we present a novel physics based analytic model for C–V characteristics of planar Schottky diodes made by a GaAs MESFET process and used in GaAs MMIC. The model focuses on small dimensions, planar technology and ion implantation tech
Publikováno v:
Cryogenics. 36:915-919
In this paper, the effective densities of states for the conduction and valence bands, Nc and Nv, the intrinsic carrier concentration ni, and the ionized doping concentration in strained Si1−xGex layers grown on (001) Si substrates are analytically
Publikováno v:
Acta Physica Sinica (Overseas Edition). 4:531-535
Heavily C-doped GaAs films, grown by metalorganic chemical vapor deposition with CCl4 as external carbon source, have been studied by Hall-effect measurements, high-resolution double-crystal x-ray diffraction, and secondary-ion-mass spectroscopy (SIM
Publikováno v:
Acta Physica Sinica (Overseas Edition). 3:384-389
The dependence of the excitonic lifetime on the well width has been studied in conventional GaAs/AlGaAs quantum wells. Two clearly different variations of the measured excitonic lifetime have been observed. For wide well widths, we find a nearly line
Autor:
Liang Zhenxian, Luo Jinsheng
Publikováno v:
Journal of Electronics (China). 8:276-282
The residual electrically active defects in (4×1012 cm−2 (30KeV)+5×1012 cm−2 (130 KeV)) Si-implanted LEC undoped Si−GaAs activated by two-step rapid thermal annealing(RTA) LABELED AS 970°C(9S)+750°C(12S) have been investigated with deep lev
Publikováno v:
Microwave and Optical Technology Letters. 12:31-33
A variable-capacitance model for a GaAs MESFET three-terminal varactor applied to MMIC voltage-controlled runing frequency is presented. In this model, because the source is connected with the drain, the gate capacitance is only considered by analyti
Publikováno v:
Proceedings of SPIE; 9/12/2022, Vol. 12287, p122871J-122871J-6, 1p