Zobrazeno 1 - 10
of 64
pro vyhledávání: '"Luke L. Hunter"'
Publikováno v:
IEEE Transactions on Nanotechnology. 7:527-531
We report on the fabrication and characterization of large-area 2-D square arrays of subwavelength holes in Ag and Al films. Fabrication is based on thermal nanoimprint lithography and metal evaporation, without the need for etching, and is compatibl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14c73a635a87b95fe37233ee3948d9e6
https://doi.org/10.1109/tnano.2008.2002648
https://doi.org/10.1109/tnano.2008.2002648
Autor:
Debiao Li, David L. Neiman, A. Alec Talin, William M. Tong, Zhiyong Li, William F. Stickle, Luke L. Hunter, R. Stanley Williams, S. R. J. Brueck
Publikováno v:
Langmuir. 23:5135-5138
We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithograph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::06e1adb723fac626f9206a5e8342b208
https://doi.org/10.1021/la063688n
https://doi.org/10.1021/la063688n
Autor:
Janelle P. Greene, Gerold A. Schneider, Sunita P. Ho, Hüseyin Özcoban, Andrew T. Jang, Kevin P. Fahey, Sabra Djomehri, Jeremy D. Lin, Luke L. Hunter
Publikováno v:
Journal of biomechanics. 46(3)
This study investigates bone-tooth association under compression to identify strain amplified sites within the bone-periodontal ligament (PDL)-tooth fibrous joint. Our results indicate that the biomechanical response of the joint is due to a combinat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b15c874ef01d2f973dae785d129e65bb
https://pubmed.ncbi.nlm.nih.gov/23219279
https://pubmed.ncbi.nlm.nih.gov/23219279
Publikováno v:
IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006..
The first reported square array of subwavelength holes patterned with nanoimprint lithography in an aluminum film is presented. Optical modes vary linearly with the refractive index of the fluid in contact with the aluminum grating
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bdf80fd4e129049454f01c9f761d3b8a
https://doi.org/10.1109/omems.2006.1708269
https://doi.org/10.1109/omems.2006.1708269
Autor:
C. Munoz, Christine M. Cuppoletti, Tiffany M.S Wilson, Douglas A. Chinn, Luke L. Hunter, F. Patrick Doty, H. Rouchanian, F. E. Jones, Michael J. King, A. Alec Talin
Publikováno v:
MRS Proceedings. 937
Organic semiconductors are under investigation for radiation sensors at Sandia National Laboratories. The wide band gaps, high resistivities, low dielectric constants, and high dielectric strengths of conjugated polymers suggest these materials may b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c8223dd8017d69bc269a40734e50962f
https://doi.org/10.1557/proc-0937-m03-04
https://doi.org/10.1557/proc-0937-m03-04
Autor:
Chu-Yeu Peter Yang, Wei-Yang Lu, Georg Aigeldinger, Cheryl A. Hauck, John T. Hachman, Michelle A. Hekmaty, James J. Kelly, D. M. Skala, John S. Korellis, Thomas A. Friedmann, Dorrance E. McLean, Luke L. Hunter, Matthew W. Losey, Stewart K. Griffiths, Nancy Y. C. Yang, Dale R. Boehme
Resist substrates used in the LIGA process must provide high initial bond strength between the substrate and resist, little degradation of the bond strength during x-ray exposure, acceptable undercut rates during development, and a surface enabling g
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16ad662c53387182b8df20236c5aa20a
https://doi.org/10.2172/923166
https://doi.org/10.2172/923166
We describe the fabrication and characterization of an electrode array test structure, designed for electrical probing of molecules and nanocrystals. We use Extreme Ultraviolet Lithography (EUVL) to define the electrical test platform features. As fa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab26ddc8a47f1b82378eadd0c22e0fa0
https://doi.org/10.2172/918247
https://doi.org/10.2172/918247
Autor:
Donna J. O'Connell, Wolf-Dieter Domke, Jonathan L. Cobb, Uzodinma Okoroanyanwu, Stefan Wurm, Frances A. Houle, Paul M. Dentinger, Gregg M. Gallatin, Martha I. Sanchez, Luke L. Hunter, Sang Hun Lee, William D. Hinsberg
Publikováno v:
Emerging Lithographic Technologies VI.
If EUV lithography is to be inserted at the 65-nm node of the 2001 International Technology Roadmap for Semiconductors, beta-tool resists must be ready in 2004. These resists should print 35-65 nm lines on a 130-nm pitch with LER below 4 nm 3s. For t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::45359886a0da4c2dc43a0873cd75f459
https://doi.org/10.1117/12.472316
https://doi.org/10.1117/12.472316
Publikováno v:
Applied Physics Letters. 89:153102
The authors present a simple top-down approach based on nanoimprint lithography to create dense arrays of silicon nanowires over large areas. Metallic contacts to the nanowires and a bottom gate allow the operation of the array as a field-effect tran
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::20da5047bf7afeb4002537138f2a0149
https://doi.org/10.1063/1.2358214
https://doi.org/10.1063/1.2358214
Autor:
Wilson, Tiffany, Doty, F. Patrick, Chinn, Douglas, Talin, A. Alec, King, Michael, Luke, L. Hunter, Frank, E. Jones, Cuppoletti, Christine, Rouchanian, H., Munoz, C.
Publikováno v:
MRS Online Proceedings Library; 2006, Vol. 937 Issue 1, p1-7, 7p