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Akademický článek

Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network

Autor: Lufeng Liao, Sikun Li, Yongqiang Che, Weijie Shi, Xiangzhao Wang

Publikováno v: Applied Sciences, Vol 12, Iss 4, p 2192 (2022)

As the designed feature size of integrated circuits (ICs) continues to shrink, the lithographic printability of the design has become one of the important issues in IC design and manufacturing. There are patterns that cause lithography hotspots in th

Externí odkaz: https://doaj.org/article/632265d57a4b46d4b453fd8ef58a98fb

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Critical pattern selection method for full-chip source and mask optimization

Autor: Sikun Li, Yayi Wei, Xiangzhao Wang, Libin Zhang, Pengzheng Gao, Weijie Shi, Lufeng Liao

Publikováno v: Optics express. 28(14)

Source and mask optimization (SMO) is one of the most important resolution enhancement techniques for integrated circuit manufacturing in 2X nm technology node and beyond. Nowadays full-chip SMO is alternatively realized by applying SMO to limited nu

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7d1921297f75adb1c9d3a3386ed91acc
https://pubmed.ncbi.nlm.nih.gov/32680128

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