Modelling of fluorine based high density plasma for the etching of silica glasses

Autor: Ahmed Rhallabi, Ludovic Lallement, Marie Claude Fernandez, Christophe Cardinaud

Publikováno v: Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2011, 29 (5), pp.051304. ⟨10.1116/1.3624786⟩

International audience; An etching simulator has been developed to study the etching of commercial silica glass (Pyrex®, D263®, AF45®, and Vycor®) in a SF6/Ar inductively coupled plasma (ICP) discharge. The etching model is based on the developme

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e305dbf5cbe2adc143189d138fd65124
https://doi.org/10.1116/1.3624786