Zobrazeno 1 - 10
of 63
pro vyhledávání: '"Lucia D'Urzo"'
Autor:
Toru Umeda, Lucia D'Urzo, Takehito Mizuno, Amarnauth Singh, Rajan Beera, Philippe Foubert, Atsushi Hattori, Waut Drent
Publikováno v:
2021 China Semiconductor Technology International Conference (CSTIC).
To comply with defect specification, Extreme Ultra-Violet (EUV) lithography necessitates performance improvement for both bulk and point-of-use (POU) filters. In this study, the data represent novel polyethylene and nylon filters for a variety of bul
Autor:
Takehito Mizuno, Philippe Foubert, Rajan Beera, Lucia D'Urzo, Toru Umeda, Amarnauth Singh, Waut Drent, Atsushi Hattori
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
Extreme Ultra-Violet (EUV) lithography is pushing material suppliers to provide the cleanest possible products for tight quality standards. The emphasis on minimizing residual particles, metals, and organics coming from materials and equipment contin
Autor:
Douglas Guerrero, Glenn Dado, Virgil Briggs, Shyam Paudel, Nick Brakensiek, Levi Gildehaus, Tim Limmer, Michael Mesawich, Vineet Alexander, Mona Bavarian, Rao Varanasi, Lucia D'Urzo
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
The silicon hardmask (Si-HM) is one of the key materials used in multilayer lithography for pattern transfer to a substrate using a fluorinated plasma etching process. Manufacturing of devices with smaller feature sizes introduces new challenges in d
Autor:
Philippe Foubert, Toru Umeda, Rao Varanasi, Atsushi Hattori, Waut Drent, Jelle Vandereyken, Lucia D'Urzo, Takehito Mizuno, Rajan Beera, Amarnauth Singh
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
The availability of EUV lithography is the mainstream for resolving critical dimension of the advanced technology nodes, currently in the range of 18nm and below [1]. The first insertion of EUVL into manufacturing utilizes chemically amplified resist
Autor:
Victor Blanco, Danilo De Simone, Geert Vandenberghe, Lucia D'Urzo, Philippe Foubert, Pieter Vanelderen, Safak Sayan, Praveen Raghavan, Boon Teik Chan, Iulian Hetel
Publikováno v:
SPIE Proceedings.
There are many knobs available that change the chemical and physical properties of the photoresists to "break" the RLS (Resolution, Sensitivity, Line edge/width roughness) trade-off, however those are not enough today to realize a material to satisfy
Autor:
Hareen Bayana, Lucia D'Urzo, Philippe Foubert, Jad Jaber, Aiwen Wu, James Hamzik, Jelle Vandereyken
Publikováno v:
SPIE Proceedings.
Specific “killer-defects”, such as micro-line-bridges are one of the key challenges in photolithography’s advanced applications, such as multi-pattern. These defects generate from several sources and are very difficult to eliminate. Pointof-use
Autor:
Hareen Bayana, Baskaran Durairaj, Hari Pathangi, Guanyang Lin, Nadia Vandenbroeck, Kaushik Sah, Yi Cao, Sung Eun Hong, Mark Somervell, Varun Vaid, Roel Gronheid, Takahiro Kitano, Jin Li, Lucia D'Urzo, Ryota Harukawa, Andrew Cross, Boon Teik Chan
Publikováno v:
SPIE Proceedings.
This manuscript shows the relationship between defectivity of a typical chemo-epitaxy sequence and the DSA-specific materials, namely the mat, the brush and the block co-polymer. We demonstrate that the density of assembly defects in a line-space DSA
Autor:
Lucia D’Urzo, Christian Gspan, Harald Plank, Gerald Kothleitner, Jan Fransaer, Stijn Schaltin, Koen Binnemans, Andrey Shkurankov
Publikováno v:
Journal of Materials Science: Materials in Electronics. 23:945-951
The "direct-on-barrier" electroplating of copper on ruthenium from a 1 mol dm−3 solution of CuCl in the ionic liquid 1-ethyl-3-methylimidazolium dicyanamide, [C2mim][N(CN)2], is reported. Continuous layers of copper with a preferential Cu(111) orie
Autor:
Lucia D’Urzo, Cosimo Pagliara, Giovanna Maggiulli, Stefano Natali, G. Giovannelli, Ivonne Sgura, Benedetto Bozzini
Publikováno v:
Journal of Solid State Electrochemistry. 14:479-494
This paper concentrates on a novel approach to the electrochemical treatment of bronze disease, based on the use of room-temperature ionic liquids (RTIL). In particular, we employed 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide as th
Publikováno v:
Corrosion Science. 51:1675-1678
In the literature on the corrosion behaviour of WC–Co hardmetal grades, it has been pointed out that – typically – corrosion resistance in several aqueous environments relies on the formation of pseudo-passivating layers on top of the two-phase