Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Lucas Lamonds"'
Autor:
Georg Erley, Xaver Thrun, Michael Frachel, Lucas Lamonds, Bryan Orf, Boris Habets, Philip Groeger, Alexander Muehle
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
To reduce defocus from leveling errors at the wafer edge, modern exposure tools offer a broad range of advanced leveling controls. These can be explored fully with minimum experimental effort by simulating alternative set-point curves (z; Rx; Ry) and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a412c3554e4ec62fd27e8b948e45e76
https://doi.org/10.1117/12.2514978
https://doi.org/10.1117/12.2514978
Autor:
Bryan Orf, Georg Erley, Michael Frachel, Alexander Muehle, Boris Habets, Philip Groeger, Xaver Thrun, Lucas Lamonds
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 18:1
Background: To reduce defocus from leveling errors at the wafer edge, modern exposure tools offer a broad range of advanced leveling controls. These additional degrees of freedom offer better leveling performance, but users hesitate to spend the tool
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::671ee9ef35f3c6892cf60ee616f2bac8
https://doi.org/10.1117/1.jmm.18.4.043505
https://doi.org/10.1117/1.jmm.18.4.043505
Publikováno v:
SPIE Proceedings.
Scribe Line Marks (SLM) printed on substrates are a standard method used by modern scanners for wafer alignment. Light reflected from the SLM forms a diffraction pattern which is used to determine the exact position of the wafer. The signal strength
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2945b680be3f03da9ffedf4d0ec8390f
https://doi.org/10.1117/12.881551
https://doi.org/10.1117/12.881551