Zobrazeno 1 - 10
of 66
pro vyhledávání: '"Luca GUIDONI"'
Publikováno v:
IEEE Photonics Journal, Vol 16, Iss 5, Pp 1-9 (2024)
In this study, a simplified transformer model is used to predict the beam waist of 1,092 nm light coupled out from SiN-based mixed pitch gratings at various heights. The beam waists data at various heights above the grating is first compiled. Then, w
Externí odkaz:
https://doaj.org/article/44cdfdddd6c54e28b81f34026d82d3b2
Publikováno v:
IEEE Photonics Journal, Vol 15, Iss 4, Pp 1-7 (2023)
In this study, SiN-based gratings with various radius of curvature (r) are designed and fabricated for the optical addressing of trapped Sr+ ion. The beam width of the light coupled out from the gratings is investigated using a self-developed Python-
Externí odkaz:
https://doaj.org/article/25ee2ee77a7e46ecb7762b4e7141e5e5
Publikováno v:
IEEE Photonics Journal, Vol 13, Iss 4, Pp 1-6 (2021)
In this work, silicon photonics structures for the optical addressing of trapped ion is developed for quantum computing applications. Grating-waveguide-grating structures of various designs are designed, and fabricated for various radius curvatures o
Externí odkaz:
https://doaj.org/article/9fbc2378abd64e1f8a5de683fa2e162d
Mixed pitch gratings are developed for the optical addressing of trapped 88Sr+ ion by means of simulation and experimental-measurement approaches. Meanwhile, Python-based data analysis techniques were developed to analyze simulated and measured beam
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0a72ed1f9dd298d85829ac756d80aca4
https://doi.org/10.1364/opticaopen.22573801
https://doi.org/10.1364/opticaopen.22573801
Autor:
Yu Dian Lim, Chuan Seng Tan, Luca Guidoni, Jing Tao, Anak Agung Alit Apriyana, Peng Zhao, Hongyu Li
Publikováno v:
IEEE Transactions on Components, Packaging and Manufacturing Technology
IEEE Transactions on Components, Packaging and Manufacturing Technology, Institute of Electrical and Electronics Engineers, 2020, 10 (4), pp.679-685. ⟨10.1109/TCPMT.2019.2958661⟩
IEEE Transactions on Components, Packaging and Manufacturing Technology, Institute of Electrical and Electronics Engineers, 2020, 10 (4), pp.679-685. ⟨10.1109/TCPMT.2019.2958661⟩
The surface-electrode ion trap is one of the key devices in modern ion-trapping apparatus to host the ion qubits for quantum computing. Surface traps fabricated on the silicon substrate have the versatility for complex electrode fabrication with 3-D
Autor:
Zhao, Peng, Li, Hong Yu, Likforman, Jean-Pierre, Henner, Theo, Lim, Yu Dian, Hu, Liang Xing, Seit, Wen Wei, Luca, Guidoni, Tan, Chuan Seng
Publikováno v:
Components, Packaging, and Manufacturing Technology, IEEE Transactions on; September 2023, Vol. 13 Issue: 9 p1337-1343, 7p
In this work, we demonstrate the addition of grounding plane into the through silicon via (TSV) integrated ion trap to minimize the ion trap heating by effectively shielding the lossy silicon substrate from RF penetration. Windows are made onto this
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::282c41b0a3645547d9b878c05cc7fedc
https://hdl.handle.net/10356/166181
https://hdl.handle.net/10356/166181
Publikováno v:
2021 IEEE 23rd Electronics Packaging Technology Conference (EPTC).
Publikováno v:
2021 IEEE 71st Electronic Components and Technology Conference (ECTC).
In this work, we report the heterogenous integration of ion trap on silicon assembled on glass interposer, where TSV, micro-bumps and redistribution layer are implemented and allow for ion trap design with significantly high flexibility. CMOS-compati
Autor:
Yu Dian Lim, Chuan Seng Tan, Luca Guidoni, Jing Tao, Peng Zhao, Wen Wei Seit, Jean-Pierre Likforman, T. Henner, Hongyu Li
Publikováno v:
Applied Physics Letters
Applied Physics Letters, American Institute of Physics, 2021, 118 (12), pp.124003. ⟨10.1063/5.0042531⟩
Applied Physics Letters, American Institute of Physics, 2021, 118 (12), pp.124003. ⟨10.1063/5.0042531⟩
In this study, we report the first Cu-filled through silicon via (TSV) integrated ion trap. TSVs are placed directly underneath electrodes as vertical interconnections between ion trap and a glass interposer, facilitating the arbitrary geometry desig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d8ea0ddbea6b9148df4b5bfb72be1fbd
http://arxiv.org/abs/2101.00869
http://arxiv.org/abs/2101.00869