Zobrazeno 1 - 10
of 34
pro vyhledávání: '"Lu Zengxiong"'
Publikováno v:
Acta Optica Sinica. 42:2105001
Publikováno v:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics.
Publikováno v:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics.
Compared with other non-contact displacement sensors, the chromatic confocal sensor, which based on wavelengthdisplacement modulation technique, has no special requirements on the material and texture of the measured surface, and suitable for measuri
Publikováno v:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics.
Compared with laser interferometer, grating displacement sensor has the advantages of small size, low cost, and strong environmental robustness. In this paper, a grating displacement sensor was proposed. The theoretical model of the grating displacem
Publikováno v:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment.
Publikováno v:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies.
For the rapid development need of the digital light processing (DLP), we designed a mini-projection lens applied to 0.65” DLP with ZEMAX. The mini-projection lens is composed of 9 group of 10 lenses, total length is 90mm, and the maximum aperture i
Publikováno v:
Laser & Optoelectronics Progress. 58:2326002
Publikováno v:
Acta Optica Sinica. 41:1905001
Publikováno v:
SPIE Proceedings.
Phase-shifting Point Diffraction Interferometer (PSPDI) utilizing nearly perfect spherical wavefront diffracted by a pinhole as reference wavefront, which diminishes the influence of reference optics used in traditional interferometers, has been deve
Publikováno v:
SPIE Proceedings.
The aberration inspection of Shack-Hartmann of lithographic lens has reached the nanometer inspection accuracy. Collimator as the key element of the system, the accurate positioning of itself is one important factor for the inspection accuracy. Based