Zobrazeno 1 - 10
of 182
pro vyhledávání: '"Lopaev, D."'
Ion-assisted surface processes are the basis of modern plasma processing. Ion energy distribution (IED) control is critical for precise material modification, especially in atomic-level technologies such as atomic layer etching. Since this control sh
Externí odkaz:
http://arxiv.org/abs/2012.14882
Akademický článek
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Autor:
Shibanov, D. R., Lopaev, D. V., Zyryanov, S. M., Zotovich, A. I., Maslakov, K. I., Rakhimov, A. T.
Publikováno v:
Journal of Applied Physics; 8/14/2023, Vol. 134 Issue 6, p1-15, 15p
Autor:
Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Koshelev, K. N., Lopaev, D. V., van der Horst, R. M., Beckers, J., Osorio, E. A., Bijkerk, F.
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured ele
Externí odkaz:
http://arxiv.org/abs/1603.08130
Autor:
Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Yakushev, O., Koshelev, K. N., Lopaev, D. V., Bijkerk, F.
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy resolved ion
Externí odkaz:
http://arxiv.org/abs/1507.02705
Autor:
Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Zotovich, A. I., Zyryanov, S. M., Lopaev, D. V., Bijkerk, F.
Publikováno v:
Plasma Sources Sci. Technol. 24, 055018 (2015)
Probe theories are only applicable in the regime where the probe's perturbation of the plasma can be neglected. However, it is not always possible to know, a priori, that a particular probe theory can be successfully applied, especially in low densit
Externí odkaz:
http://arxiv.org/abs/1412.3036
Publikováno v:
Plasma Sources Science & Technology; Aug2024, Vol. 33 Issue 8, p1-16, 16p
Autor:
Melezhenko, D. E., Lopaev, D. V., Mankelevich, Yu. A., Khlebnikov, S. A., Solovykh, A. A., Novikov, L. S., Voronina, E. N.
Publikováno v:
Inorganic Materials: Applied Research; Jun2024, Vol. 15 Issue 3, p707-715, 9p
Akademický článek
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Molecular contamination of a grazing incidence collector for extreme ultraviolet (EUV) lithography was experimentally studied. A carbon film was found to have grown under irradiation from a pulsed tin plasma discharge. Our studies show that the film
Externí odkaz:
http://arxiv.org/abs/1411.4509