Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Longfei Shen"'
Publikováno v:
Frontiers in Pharmacology, Vol 13 (2022)
Background: The (R)-CDOP combination regimen, based on pegylated liposomal doxorubicin, is increasingly used for elderly patients with non-Hodgkin’s lymphoma. However, the cardiotoxicity and efficacy of the (R)-CDOP regimen compared with convention
Externí odkaz:
https://doaj.org/article/4bcf1f09f57d43728e2b2ce811fd1b03
Autor:
Jiaying Xie, Zhoujie Tong, Longfei Shen, Yuanyuan Shang, Yulin Li, Bin Lu, Weixuan Ma, Wei Zhang, Ming Zhong
Publikováno v:
Emergency and Critical Care Medicine. 2:32-38
Autor:
Pengzhen Zhang, Kai You, Longfei Shen, Toby Yu, Jerry Fang, Summer Sui, Chengkun Li, Ji-Ling Hou, Pandeng Xuan, Shiwei Ren, Yaobin Feng, Saravana Prakash Shanmugasundaram, Babak Mozooni, Jolly Xu
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
The technology evolution of 3D-NAND storage devices requires an extensive research and development (R and D) phase with frequent process changes during the film deposition, lithography and etching steps. These process changes might have an impact on
Autor:
Farzad Farhadzadeh, Elliott Mc Namara, Wenkang Song, Eason Su, Hongwei Zhu, Jing Wang, Marc Noot, Simon Gijsbert Josephus Mathijssen, Longfei Shen, Kaustuve Bhattacharyya, Ji-Ling Hou, Jie Du, Yu Liu, Sheng-Tsung Tsao, Sunny Xia, Chia-Hung Chen, Kimi Yang, David Xu, Zhi-Qiang Tang, Herman Heijmerikx, Xing Ma
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
Advancing technology nodes in DRAM continues to drive the reduction of on-product overlay (OV) budget. This gives rise to the need for OV metrology with greater accuracy. However, the ever increasing process complexity brings additional challenges re
Autor:
Herman Heijmerikx, Longfei Shen, Farzad Farhadzadeh, Kaustuve Bhattacharyya, Huajun Qin, Yaobin Feng, Lineke van der Sneppen, Fei Jia, Arie Jeffrey Den Boef, Elliott Mc Namara, Jolly Xu, Chao Fang, Simon Gijsbert Josephus Mathijssen, Marc Noot
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
Metrology requirements at advanced nodes are not only tightening on specifications but also broadening in terms of flexibility needed to cover variety of product stacks. Metrology targets need to be process compatible and at the same time these targe
Autor:
van der Tol, Jos J. G. M., Yuqing Jiao, Longfei Shen, Millan-Mejia, Alonso, Pogoretskii, Vadim, van Engelen, Jorn P., Smit, Meint K.
Publikováno v:
IEEE Journal of Selected Topics in Quantum Electronics; Jan/Feb2018, Vol. 24 Issue 1, p9-17, 9p, 6 Diagrams, 1 Chart, 2 Graphs
Autor:
van Engelen, Jorn P., Longfei Shen, Roelkens, Gunther, Yuqing Jiao, Smit, Meint K., van der Tol, Jos J. G. M.
Publikováno v:
IEEE Journal of Selected Topics in Quantum Electronics; Jan/Feb2018, Vol. 24 Issue 1, p1-8, 8p, 2 Diagrams, 1 Chart, 8 Graphs
Autor:
Zizheng Cao, Yuqing Jiao, Longfei Shen, Xinran Zhao, Stabile, Ripalta, van der Tol, Jos, Ton Koonen
Publikováno v:
Journal of Lightwave Technology; Jan2018, Vol. 36 Issue 1, p57-67, 11p
Autor:
Yuqing Jiao, de Vries, Tjibbe, Unger, Ralph-Stephan, Longfei Shen, Ambrosius, Huub, Radu, Calin, Arens, Michael, Smit, Meint, van der Tol, Jos
Publikováno v:
Journal of The Electrochemical Society; 2015, Vol. 162 Issue 8, pE90-E95, 6p