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pro vyhledávání: '"Long Eric Ma"'
Autor:
Hiroshi Mohri, Jack Jau, Tadahiko Takikawa, Long Eric Ma, Yuichi Inazuki, Fei Wang, Chiyan Kuan, Takeya Shimomura, Kawashima Satoshi, Naoya Hayashi, Tsukasa Abe, Hong Xiao, Yan Zhao
Publikováno v:
SPIE Proceedings.
Fabrication of defect free EUV masks including their inspection is the most critical challenge for implementing EUV lithography into semiconductor high volume manufacturing (HVM) beyond 22nm half-pitch (HP) node. The contact to bit-line (CB) layers o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::720785f374a13725d77021f755f9e6b4
https://doi.org/10.1117/12.879565
https://doi.org/10.1117/12.879565
