Zobrazeno 1 - 10
of 313
pro vyhledávání: '"Lisong Dong"'
Publikováno v:
Opto-Electronic Advances, Vol 7, Iss 4, Pp 1-11 (2024)
Extreme ultraviolet (EUV) lithography with high numerical aperture (NA) is a future technology to manufacture the integrated circuit in sub-nanometer dimension. Meanwhile, source mask co-optimization (SMO) is an extensively used approach for advanced
Externí odkaz:
https://doaj.org/article/2feb540431a94d1194b5de2f44e7a687
Publikováno v:
Journal of Microelectronic Manufacturing, Vol 1, Iss 1 (2018)
Micro-sieves have been widely used in medical treatment, quarantine, environment, agriculture, pharmacy and food processing. However, the manufacturing and yield improvement have been difficult due to multiple challenges, such as the sieve unit relea
Externí odkaz:
https://doaj.org/article/30202f05a1d94f2fa27b22686c52bd22
Publikováno v:
Optics Express.
Publikováno v:
Novel Patterning Technologies 2023.
Publikováno v:
Advances in Patterning Materials and Processes XL.
Publikováno v:
DTCO and Computational Patterning II.
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 35:309-317
Autor:
Shiling, Jia, Ling, Zhao, Xiangyu, Wang, Yunjing, Chen, Hongwei, Pan, Lijing, Han, Huiliang, Zhang, Lisong, Dong, Huixuan, Zhang
Publikováno v:
International Journal of Biological Macromolecules. 201:662-675
Poly (lactic acid) (PLA) blends with different toughening agents were prepared by melt compounding, and the effects of toughening agents on the toughness of PLA, especially the low-temperature toughness, were investigated. All blends were immiscible
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Publikováno v:
ACS Applied Polymer Materials. 3:5932-5941