Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Lippert, Johannes"'
The invention relates to a mirror for a microlithographic projection exposure system, and to a method for operating a deformable mirror. According to one aspect of the invention, a mirror has an active optical area (11), a mirror substrate (12), a re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::7572b27658618483bd26dc093ce6c103
https://research.utwente.nl/en/publications/mirror-for-a-microlithographic-projection-exposure-system-and-method-for-operating-a-deformable-mirror(66612b3a-06f1-407a-a5a2-f6037106d4a5).html
https://research.utwente.nl/en/publications/mirror-for-a-microlithographic-projection-exposure-system-and-method-for-operating-a-deformable-mirror(66612b3a-06f1-407a-a5a2-f6037106d4a5).html
