Výsledky vyhledávání - "Lipfert, Sebastian"

Comparison of EUV Photomask Metrology Between CD-AFM and TEM

Autor: Gaoliang Dai, Kai Hahm, Lipfert Sebastian, Markus Heidelmann

Accurate metrology of extreme ultraviolet (EUV) photomask is a crucial task. In this paper, two different methods for reference EUV photomask metrology are compared. One is the critical dimension atomic force microscopy (CD-AFM). In the measurements,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e9cde3171787dfffbff984caa81810f3
https://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&origin=inward&scp=85124108393

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Correction: Comparison of EUV Photomask Metrology Between CD-AFM and TEM

Autor: Gaoliang Dai, Kai Hahm, Lipfert Sebastian, Markus Heidelmann

Publikováno v: Nanomanufacturing and Metrology. 5:440-440

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5d62e087625d0176d43638b8e7b991cc
https://doi.org/10.1007/s41871-022-00165-3

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Conference

Nanomaterials produced by laser ablation techniques, Part II: High spatially resolved nondestructive characterization of nanostructures.

Autor: Koehler, Bernd, Murray, Paul, Shin, Eunsung, Lipfert, Sebastian, Schreiber, Juergen

Publikováno v: Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61750C-61750C-9, 9p

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Conference

Ion-beam sputter deposition of x-ray multilayer optics on large areas.

Autor: Gawlitza, Peter, Braun, Stefan, Lipfert, Sebastian, Leson, Andreas

Publikováno v: Proceedings of SPIE; Nov2006 Part 2, Issue 1, p63170G-63170G-9, 9p

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Akademický článek

Herstellung von Präzisionsschichten mittels Ionenstrahlsputtern.

Autor: Gawlitza, Peter, Braun, Stefan, Leson, Andreas, Lipfert, Sebastian, Nestler, Matthias

Publikováno v: Vakuum in Forschung und Praxis; Apr2007, Vol. 19 Issue 2, p37-43, 7p

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