Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Lionel Brige"'
Autor:
Paolo Canestrari, Gianfranco Capetti, Umberto Iessi, Elio De Chiara, Sanne Smit, Pierluigi Rigolli, Leonardo Amato, Lionel Brige, Christine Llorens, Johannes Plauth
Publikováno v:
SPIE Proceedings.
Aggressive pitch requirements for line/space pattern devices require the usage of extreme off-axis illumination schemes to enhance the resolution of the exposure tools. These illumination schemes stress the quality of the optics because of the anisot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6144dae1aeb7c630337e5be423f0a140
https://doi.org/10.1117/12.814148
https://doi.org/10.1117/12.814148
Autor:
Alexander Serebryakov, Emmanuel Boisseau, Vincent Coutellier, Eric Peloquin, Lionel Brige, Jonathan Planchot
Publikováno v:
25th European Mask and Lithography Conference.
In a semiconductor factory, each lithographic scanner is combined with a laser source and a track to form a lithocell. Quite frequently, lithographers have to deal with running the same lithographic process on multiple lithocells. Usually a new proce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f1b670305d5cca80a8641eceb690756
https://doi.org/10.1117/12.835203
https://doi.org/10.1117/12.835203
Autor:
Louis Anastos, Kevin M. Golden, Roger H. Taylor, Alexander L. Martin, Alvin G. Thomas, Christopher P. Ausschnitt, John Balas, James T. Marsh, David T. Long, Lionel Brige
Publikováno v:
SPIE Proceedings.
The use of sendahead wafers to control a lithography sector severely limits the performance of that sector. As a result, the elimination of sendahead wafers is most desirable. Through the creation of a robust resist process, careful metrology and mod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a5499018d16f0410988042f0901bccae
https://doi.org/10.1117/12.59840
https://doi.org/10.1117/12.59840
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