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pro vyhledávání: '"Linke Jian"'
Autor:
Dacheng Wang, Lingchao Zhang, Yandong Gong, Linke Jian, T. Venkatesan, Cheng-Wei Qiu, Minghui Hong
Publikováno v:
IEEE Photonics Journal, Vol 8, Iss 1, Pp 1-8 (2016)
Metasurfaces open up a low-dimensional artificial approach to tailor electromagnetic (EM) waves with unprecedented functionalities. However, the ability to actively control and manipulate EM waves via metasurfaces still faces challenges that need to
Externí odkaz:
https://doaj.org/article/c12413c476f945df9c1c41a0b7ca73ca
Akademický článek
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Autor:
Martin Wolf, Thirumalai Venkatesan, Jan Nötzold, N. Kamaraju, Linke Jian, Surajit Saha, Tobias Kampfrath, Andrea Rubano, R. Kramer Campen
Publikováno v:
Light: Science & Applications
Coherent radiation with frequencies ranging from 0.3 to 30 THz has recently become accessible by femtosecond laser technology. Terahertz (THz) waves have already found many applications in spectroscopy and imaging, and they can be manipulated using s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c2b00c5adb7457cfcf0e59eb59fdcca1
http://hdl.handle.net/11588/694512
http://hdl.handle.net/11588/694512
Autor:
Herbert O. Moser, Linke Jian, Mohammed Bahou, B. Didier F. Casse, Shenbaga M. P. Kalaiselvi, Gang Liu, Sivakumar M. Maniam, Pengda Gu, Ao Chen, Sascha P. Heussler, Shahrain bin Mahmood, Li Wen, Jin Au Kong, Hongsheng Chen, Xiangxiang Cheng, Bae-Ian Wu, Rogério Magalhaes Paniago
Publikováno v:
AIP Conference Proceedings.
The development of electromagnetic metamaterials by micro/nanomanufacturing at SSLS has led to matrix‐embedded or substrate‐supported rod‐split‐ring‐based samples reaching left‐handed pass‐bands at 216 THz or 1.39 μm and to free‐spac
Autor:
Jost Goettert, Daniel Schondelmaier, Yohannes M. Desta, Heinz-Ulrich Scheunemann, Linke Jian, Bernd Loechel
Publikováno v:
SPIE Proceedings.
The production of X-ray masks is one of the key techniques for X-ray lithography and the LIGA process. Different ways for the fabrication of X-ray masks has been established. Very sophisticated, difficult and expensive procedures are required to prod
Autor:
Yoonyoung Jin, Martin Bednarzik, Georg Aigeldinger, Gisela Ahrens, Linke Jian, Gabi Gruetzner, Ralf Ruhmann, Varshni Singh, Jost Goettert, Reinhard Degen, Yohannes M. Desta, Bernd Loechel
Publikováno v:
SPIE Proceedings.
Poly-methylmethacrylate (PMMA), a positive resist, is the most commonly used resist for deep X-ray lithography (DXRL)/LIGA technology. Although PMMA offers superior quality with respect to accuracy and sidewall roughness but it is also extremely inse
Autor:
Martin Bednarzik, Jost Goettert, Michael D. Bryant, Daejong Kim, Zhengchun Peng, Yoonyoung Jin, Sanghoon Lee, Heinz Ulrich Scheunemann, Linke Jian, Bernd Loechel, Yohannes M. Desta
Publikováno v:
SPIE Proceedings.
During the past few years, graphite based X-ray masks have been in use at CAMD and BESSY to build a variety of high aspect ratio microstructures and devices where low side wall surface roughness is not needed In order to obtain lower sidewall surface
Publikováno v:
SPIE Proceedings.
For patterning thick photoresist films, x-ray lithography is superior to optical lithography because of the use of a shorter wavelength and a very large depth of focus. SU-8 negative resist is well suited to pattern tall, high-aspect ratio microstruc
Publikováno v:
Advances in Resist Technology and Processing XVII.
SU-8 has great potential in low cost ultra-thick high aspect ratio MEMS applications. Although a broad range of thickness (from micrometer to mm) can be obtained by spin coating, the works about the sidewall profile and dimension control of SU-8 micr
Autor:
Dacheng Wang, Lingchao Zhang, Yinghong Gu, Mehmood, M. Q., Yandong Gong, Srivastava, Amar, Linke Jian, Venkatesan, T., Cheng-Wei Qiu, Minghui Hong
Publikováno v:
Scientific Reports; 10/9/2015, p1-9, 9p