Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Ling-Shan Gao"'
Autor:
Ling-Shan Gao, Qing-Yuan Cai, Er-Tao Hu, Qiu-Yu Zhang, Yu-Ting Yang, Yun-Bo Xiong, Bao-Jian Liu, Wei-Bo Duan, Tian-Yan Yu, Ding-Quan Liu
Publikováno v:
Optics Express. 31:13503
Optimizing the atomic layer deposition (ALD) process of films is particularly important in preparing multilayer interference films. In this work, a series of Al2O3/TiO2 nano-laminates with a fixed growth cycle ratio of 1:10 were deposited on Si and f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e3dd25d7c6710f0cb4b032dd98ce557
https://doi.org/10.1364/oe.487881
https://doi.org/10.1364/oe.487881
UV Broadband Antireflection Coating Using Al2O3, HfO2 and SiO2 Multilayer by Atomic Layer Deposition
Publikováno v:
Optical Interference Coatings Conference (OIC) 2019.
UV broadband antireflection film M2HL in 250~390 nm spectral range was prepared by ALD using HfO2 as H layer. Higher transmittance was acquired when HfO2-Al2O3 nano-laminate replaced of HfO2 in the AR coating.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b71ab198d4c013df6126724c14e925cf
https://doi.org/10.1364/oic.2019.fb.5
https://doi.org/10.1364/oic.2019.fb.5
Autor:
Ling-Shan Gao, Ertao Hu, Hai-Han Luo, Li Yaopeng, Jing Zhou, Yu-Xiang Zheng, Dingquan Liu, Qing-Yuan Cai, Liu Baojian
Publikováno v:
Optics Express. 29:13815
A reaction chamber of atomic layer deposition (ALD) was developed for simultaneous coating on the inner and outer surfaces of a large-size and strongly curved glass bowl. The inner surface ALD process was in a showerhead reaction mode and the outer s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9c0c7075eafd6bbb3be4be0d45135d6d
https://doi.org/10.1364/oe.423085
https://doi.org/10.1364/oe.423085