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pro vyhledávání: '"Linda L. Kenyon"'
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography X.
Currently, the state-of-the-art for particle detection in photoresist is liquid laser scattering technology, which has a particle size capability of approximately 0.25 micrometer for photoresist. Surface tool particle size capabilities are similar, a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::664fa3408f6871632e2dd2554f8cd3a3
https://doi.org/10.1117/12.240083
https://doi.org/10.1117/12.240083
