Výsledky vyhledávání - "Linda K. Sundberg"

Analysis of tin oxide thin films fabricated via sol-gel and delayed ignition of combustion processes

Autor: Robert D. Miller, Linda K. Sundberg, Andrea Fasoli, Francesco Ceccarelli, Luisa D. Bozano, Krystelle Lionti

Publikováno v: ISOCS/IEEE International Symposium on Olfaction and Electronic Nose (ISOEN), Montreal (Canada), 28-31/05/2017
info:cnr-pdr/source/autori:Fasoli, Andrea; Lionti, Krystelle; Sundberg, Linda; Miller, Robert D.; Ceccarelli, Francesco; Bozano, Luisa/congresso_nome:ISOCS%2FIEEE International Symposium on Olfaction and Electronic Nose (ISOEN)/congresso_luogo:Montreal (Canada)/congresso_data:28-31%2F05%2F2017/anno:2017/pagina_da:/pagina_a:/intervallo_pagine

Metal oxide semiconductor (MOS) gas sensors based on thin film technology offer the potential of higher sensitivity and faster response and recovery than their thick film counterparts. Solution-based approaches are facile and inexpensive routes to pr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1ff85f5e30cdc1b65457e1de36d027b7
https://doi.org/10.1109/isoen.2017.7968896

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A Fundamental Study on Dissolution Behavior of High-Resolution Molecular Glass Photoresists

Autor: Anuja De Silva, Robert David Allen, Hiroshi Ito, Linda K. Sundberg, Christopher K. Ober, Ratnam Sooriyakumaran

Publikováno v: Chemistry of Materials. 20:7292-7300

Understanding the dissolution behavior of photoresist materials is an important step in being able to control their lithographic performance. In this paper, we present a fundamental study of dissol...

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ddea6dbab684d0b7a09d35c926acc4b5
https://doi.org/10.1021/cm802295y

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Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy

Autor: Linda K. Sundberg, Vivek M. Prabhu, Daniel A. Fischer, Sharadha Sambasivan, Robert D. Allen

Publikováno v: Applied Surface Science. 253:1010-1014

Near-edge X-ray absorption fine structure (NEXAFS) spectroscopy was used to quantify the surface composition and depth profiling of photoacid generators in thin film photoresist materials by varying the entrance-grid bias of a partial electron yield

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4fd26648730689b60bc75047a7433617
https://doi.org/10.1016/j.apsusc.2006.03.089

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Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography

Autor: Linda K. Sundberg, Daniel P. Sanders, A. D. Allen, R. Sooriyakumaran, R. A. Dipietro, P. J. Brock, Gregory Breyta

Publikováno v: Journal of Photopolymer Science and Technology. 19:569-572

The fundamental properties of a series of hexafluoroalcohol-bearing methacrylate polymers (HFA-MA) are reported here. The material behavior is heavily influenced by the linking group between the methacrylate ester (or polymer backbone) and the hexafl

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7ed915a5d4c62b6781d6138f470158a1
https://doi.org/10.2494/photopolymer.19.569

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Fluoroalcohol-Methacrylate Resists for 193nm Lithography

Autor: Mahmoud Khojasteh, Margaret C. Lawson, Gary Dabbagh, Linda K. Sundberg, Y. Nishiyama, Kuang-Jung J. Chen, Tsutomu Shimokawa, M. Siezak, Takashi Chiba, P. J. Brock, Ranee Wai-Ling Kwong, R. Sooriyakumaran, Wai-kin Li, P. R. Varanasi, Robert D. Allen, Kaushal Patel, Z. Liu

Publikováno v: Journal of Photopolymer Science and Technology. 18:381-387

We have designed and developed a variety of hexafluoroalcohol (HFA) pendant methacrylate monomers and the corresponding imaging polymers for ArF lithography. It was found that HFA side chains are critical for "swelling free" dissolution properties fo

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4fc926f2dd071180a830aa55c0c13920
https://doi.org/10.2494/photopolymer.18.381

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Positive Resists Based on Non-polymeric Macromolecules

Autor: Robert D. Allen, Sean D. Burns, Dario L. Goldfarb, Ratnam Sooriyakumaran, Wu-Song Huang, Hiroshi Ito, Linda K. Sundberg, Mark Morris, Bill Hinsberg, Dirk Pfeiffer, Truong Hoa

Publikováno v: Journal of Photopolymer Science and Technology. 18:425-429

Derivatives of Polyhedral Oligomeric Silsesquioxanes (POSS) and Oligosaccharides have been investigated as potential candidates for high resolution resists. POSS materials are cage compounds with defined mono-disperse molecular weights. Oligosacchari

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2ba7129ac84c25700df1b217a453b7b0
https://doi.org/10.2494/photopolymer.18.425

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Templating Organosilicate Vitrification Using Unimolecular Self-Organizing Polymers Prepared from Tandem Ring Opening and Atom Transfer Radical Polymerizations

Autor: Teddie Magbitang, Eric F. Connor, V. Y. Lee, Hyungjun Kim, W. Volksen, Linda K. Sundberg, R. D. Miller, Craig J. Hawker, J. L. Hedrick

Publikováno v: Macromolecular Symposia. 215:295-306

A unimolecular templating star-shaped polymer with a compatibilizing outer corona, prepared by tandem ROP/ATRP procedures, was dispersed into a thermosetting organosilicate. The organic polymer was thermalized to leave behind its latent image in the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b64be51a59b12349af41f74b99b71348
https://doi.org/10.1002/masy.200451123

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Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond

Autor: Linda K. Sundberg, Martha I. Sanchez, Yoshio Kawai, Amy E. Zweber, T. Senna, Keiichi Masunaga, Joseph L. Malenfant, I. Yoshida, Luisa D. Bozano, R. Bowley, Satoshi Watanabe, R. Sooriyakumaran, T. Isogawa, Y. Sakamoto, T. Komizo, Tom Faure, Steven C. Nash, M. Tanabe, M. Kagawa

Publikováno v: SPIE Proceedings.

The critical layer masks for 14 nm and 10 nm logic nodes are typically bright field, and the key features are opaque structures on the mask. In order to meet the tight critical dimension (CD) requirements on these opaque features the use of a high qu

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ba208a027d1dca190e2a9c7b4cadf903
https://doi.org/10.1117/12.2069031

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ICE: Ionic contrast enhancement for organic solvent negative tone develop

Autor: Gregory M. Wallraff, Linda K. Sundberg, Hoa D. Truong, Luisa D. Bozano, Martha I. Sanchez, Karen Petrillo, William D. Hinsberg, Dario L. Goldfarb

Publikováno v: SPIE Proceedings.

The use of organic solvents in the development of chemically amplified (CA) resists has been known since the introduction of DUV lithography into manufacturing over twenty years ago [1,2]. In this approach a negative tone image is produced using an a

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ef31f7e4d8126237eb2e2e8b289b359b
https://doi.org/10.1117/12.2046762

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