Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Lilach Saltoun"'
Autor:
Raz, Lilach Saltoun, Sachyani Keneth, Ela, Jang, Youngjin, Shapiro, Arthur, Cohen, Eyal, Yochelis, Shira, Lifshitz, Efrat, Magdassi, Shlomo, Paltiel, Yossi
Publikováno v:
In Sensors & Actuators: A. Physical 15 August 2019 295:469-473
Autor:
Ela Sachyani Keneth, Eyal Cohen, Youngjin Jang, Yossi Paltiel, Shira Yochelis, Lilach Saltoun Raz, Arthur Shapiro, Efrat Lifshitz, Shlomo Magdassi
Publikováno v:
Sensors and Actuators A: Physical. 295:469-473
Over the last two decades, carbon based materials and especially carbon nanotubes (CNTs), were the subject of many studies, mainly due to their unique electrical, optical and mechanical properties (Ouyang et al., 2002; Dresselhaus et al., 2003; Dress
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8222de9ed290b6294dba9347dfa3a1c
https://doi.org/10.1016/j.sna.2019.06.039
https://doi.org/10.1016/j.sna.2019.06.039
Autor:
Chanha Park, Minhyung Hong, Sangjun Han, John C. Robinson, Jieun Lee, Tal Marciano, Zephyr Liu, Dana Klein, Dongsub Choi, Roie Volkovich, Ahlin Choi, Hao Mei, Eitan Hajaj, Dohwa Lee, Lilach Saltoun, Jung-Tae Lee, Eitan Herzel, Wayne (Wei) Zhou, Dongyoung Lee, Anna Golotsvan, Jeongpyo Lee, Honggoo Lee, Eran Amit, Sanghuck Jeon, Seongjae Lee
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
Overlay process control is a critical aspect of integrated circuit manufacturing. Advanced DRAM manufacturing overlay error budget approaches the sub-2nm threshold, including all sources of overlay error: litho processing, non-litho processing, metro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8a0933a14a7bfd8a38c5715b72d8f3f
https://doi.org/10.1117/12.2515015
https://doi.org/10.1117/12.2515015
Autor:
Evgeni Gurevich, Yaron DeLeeuw, Dror Alumot, Mark Wagner, Yuval Lamhot, Ido Adam, Ze'ev Lindenfeld, Barak Bringoltz, Eltsafon Ashwal, James Manka, Dana Klein, Tom Leviant, Lilach Saltoun, Noga Sella, Yoel Feler, Xindong Gao, Tal Marciano, Bryan Chen, Tal Yaziv
Publikováno v:
SPIE Proceedings.
In this paper we discuss the mechanism by which process variations determine the overlay accuracy of optical metrology. We start by focusing on scatterometry, and showing that the underlying physics of this mechanism involves interference effects bet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a58e26b2721101931a995682b84bbcc
https://doi.org/10.1117/12.2219176
https://doi.org/10.1117/12.2219176
Autor:
Honggoo Lee, Yoonshik Kang, Sangjoon Han, Kyuchan Shim, Minhyung Hong, Seungyoung Kim, Jieun Lee, Dongyoung Lee, Eungryonh Oh, Ahlin Choi, Youngsik Kim, Marciano, Tal, Klein, Dana, Hajaj, Eitan M., Aharon, Sharon, Ben-Dov, Guy, Lilach, Saltoun, Serero, Dan, Golotsvan, Anna
Publikováno v:
Proceedings of SPIE; 2018, Vol. 10585, p1-12, 12p
Publikováno v:
Journal of Physics: Conference Series. 750:012011
Nature often arranges atoms in the shape of perfect crystals, but sometimes she creates defects and multiple domains. The optimal crystal shape at zero kelvin can be found via the Wulff construction, which can be only be carried out analytically for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::77e0c39fe8bdd1c8590cd14ec9349a07
https://doi.org/10.1088/1742-6596/750/1/012011
https://doi.org/10.1088/1742-6596/750/1/012011
Autor:
Ukraintsev, Vladimir A., Adan, Ofer, Lee, Honggoo, Kang, Yoonshik, Han, Sangjoon, Shim, Kyuchan, Hong, Minhyung, Kim, Seungyoung, Lee, Jieun, Lee, Dongyoung, Oh, Eungryong, Choi, Ahlin, Kim, Youngsik, Marciano, Tal, Klein, Dana, Hajaj, Eitan M., Aharon, Sharon, Ben-Dov, Guy, Lilach, Saltoun, Serero, Dan, Golotsvan, Anna
Publikováno v:
Proceedings of SPIE; March 2018, Vol. 10585 Issue: 1 p1058532-1058532-12
Publikováno v:
Journal of Physics: Conference Series; 2016, Vol. 750 Issue 1, p1-1, 1p