Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Liang-Hsun Lai"'
Autor:
Liang-Hsun Lai, 賴良訓
102
In thermal chemical vapor deposition (CVD) process, the characteristics of obtained pyrolytic carbon films are influenced by many factors including the precursor gas, mass flow rate of inlet gas, deposition temperature, and working pressure.
In thermal chemical vapor deposition (CVD) process, the characteristics of obtained pyrolytic carbon films are influenced by many factors including the precursor gas, mass flow rate of inlet gas, deposition temperature, and working pressure.
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/72987711450492377134
Autor:
Liang-Hsun Lai, 賴良訓
98
This study investigates the effects of different radio-frequency (rf) powers on the properties of carbon coatings on optical fibers that are prepared by thermal chemical vapor deposition enhanced with inductively coupled plasma. Methane (16 s
This study investigates the effects of different radio-frequency (rf) powers on the properties of carbon coatings on optical fibers that are prepared by thermal chemical vapor deposition enhanced with inductively coupled plasma. Methane (16 s
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/55956265831234840527
Autor:
Wen-Feng Hsieh, Yung-Chi Wu, Wei-Lun Huang, Minghwei Hong, H. W. Wan, Tsung-Hung Chiang, Wei-Rein Liu, Chia-Hung Hsu, Liang-Hsun Lai, J. Kao
Publikováno v:
ACS Applied Nano Materials. 1:3829-3836
We report the structural and optical properties of ten-period ZnO/MgxZn1–xO multiple quantum wells (MQWs) prepared on the most widely used semiconductor material, Si. The introduction of a nanometer thick high-k Y2O3 transition layer between Si (11
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad5951905214b8a2ef58487cb2a49bdb
https://doi.org/10.1021/acsanm.8b00595
https://doi.org/10.1021/acsanm.8b00595
Publikováno v:
Thin Solid Films. 570:356-362
The effects of radio-frequency (rf) power on the properties of carbon thin films prepared by thermal chemical vapor deposition (CVD) enhanced with remote inductively-coupled-plasma (ICP) are investigated. Acetylene and nitrogen were used as the precu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02c016e495a71d1b50f708690ab23ad1
https://doi.org/10.1016/j.tsf.2014.02.108
https://doi.org/10.1016/j.tsf.2014.02.108
Publikováno v:
Thin Solid Films. 556:544-551
The properties of carbon films prepared by thermal chemical vapor deposition (thermal CVD) using camphor are investigated. As the deposition temperature increases from 1098 to 1198 K, the deposition rate follows the Arrhenius law with activation ener
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e05914741608750cbdfedf4003009384
https://doi.org/10.1016/j.tsf.2014.01.035
https://doi.org/10.1016/j.tsf.2014.01.035
Publikováno v:
ECS Journal of Solid State Science and Technology. 3:M45-M53
This study investigates the correlation between thermal chemical vapor deposition kinetics and characteristics of smooth laminar carbon films using propane/ammonia (C3H8/NH3) mixtures. During the deposition process, a residual gas analyzer is used to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b62b7278422510267bf2a804bb649819
https://doi.org/10.1149/2.0051408jss
https://doi.org/10.1149/2.0051408jss
Publikováno v:
Journal of Applied Physics; Sep2010, Vol. 108 Issue 5, p053519-35194, 4p, 1 Diagram, 6 Graphs
Publikováno v:
ECS Journal of Solid State Science and Technology. 2:N80-N88
When ethylene/ammonia (C2H4/NH3) mixtures are used to deposit carbon films by thermal chemical vapor deposition (CVD), effects of C2H4/(C2H4+NH3) ratios on the deposition rate and microstructures of carbon films are investigated. Experimental results
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a68031ac5312ee20ae18ce80cf4db338
https://doi.org/10.1149/2.023304jss
https://doi.org/10.1149/2.023304jss
Autor:
Sham-Tsong Shiue, Liang-Hsun Lai
Publikováno v:
Surface and Coatings Technology. 215:161-169
Effects of the C2H2/(C2H2 + NH3) ratio on the properties of thermal chemical vapor deposition (CVD) carbon films are investigated. Experimental results indicate that the deposition rate of carbon films increases with increase of the C2H2/(C2H2 + NH3)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a5777214e33a9ffb7e7ffb81cc85b73
https://doi.org/10.1016/j.surfcoat.2012.10.068
https://doi.org/10.1016/j.surfcoat.2012.10.068
Publikováno v:
Vacuum. 87:141-144
This study investigates the effects of different radio-frequency (rf) powers on the characteristics of carbon coatings on optical fibers that are prepared by thermal chemical vapor deposition (thermal CVD) enhanced with inductively coupled plasma (IC
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb46e39daa6f901cba0c217e964a73a0
https://doi.org/10.1016/j.vacuum.2012.02.015
https://doi.org/10.1016/j.vacuum.2012.02.015