Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Lewis W. Flanagin"'
Publikováno v:
Journal of Polymer Science Part B: Polymer Physics. 37:2103-2113
The resolution of photolithographic processes has advanced to the point that difficulties, such as line-edge roughness, associated with phenomena occurring at molecular length scales are becoming important. In order to control these phenomena, it is
Autor:
Lewis W. Flanagin, William Dinan Hinsberg, Christopher L. McAdams, Isaac C. Sanchez, C. Grant Willson
Publikováno v:
Macromolecules. 32:5337-5343
The dissolution phenomena that are the basis of microlithography are largely dependent on the acid−base equilibrium of phenolic polymers in aqueous base. Fundamental equations are derived to relate the probabilistic quantities of the critical-ioniz
Publikováno v:
The Journal of Physical Chemistry B. 101:7998-8005
The solvation structure and free energy for Li+, Na+, K+, F-, Cl-, Be2+, Mg2+, and Ca2+ in supercritical aqueous solutions are described by a dielectric concentric shell model incorporating solvent adsorption analogous to a Langmuir model. The ratio
Autor:
Carlton G Willson, Pavlos C. Tsiartas, Isaac C. Sanchez, Roger T. Bonnecaze, William D. Hinsberg, Lewis W. Flanagin, Clifford L. Henderson
Publikováno v:
Macromolecules. 30:4656-4664
The function of common, positive tone photoresist materials is based on radiation-induced modulation of the dissolution rate of phenolic polymer films in aqueous base. The process through which novolac and other low molecular weight phenolic polymers
Publikováno v:
The Journal of Physical Chemistry. 99:5196-5205
Autor:
Thuc Dam, Scott Jessen, Lewis W. Flanagin, Guangming Xiao, Bob Gleason, Steve Prins, Timothy Lin, Simon Chang, James Walter Blatchford, Sean C. O'Brien
Publikováno v:
SPIE Proceedings.
Design rule (DR) development strategies were fairly straightforward at earlier technology nodes when node-on-node scaling could be accommodated easily by reduction of /NA. For more advanced nodes, resolution enhancement technologies such as off-axis
Publikováno v:
SPIE Proceedings.
In this paper we present a method that optimizes the OPC model generation process. The elements in this optimized flow include: an automated test structure layout engine; automated SEM recipe creation and data collection; and OPC model anchoring/vali
Autor:
Sean D. Burns, Gerard M. Schmid, C. Grant Willson, Paula M. Wetmore, Lewis W. Flanagin, Gardiner Allen B, Val J. Krukonis, Jodie L. Lutkenhaus
Publikováno v:
SPIE Proceedings.
This work focuses on understanding the dissolution phenomenon of surface inhibition, which is observed often in the development of novolac based resists. Many theories have been offered to explain this phenomenon, including a concentration gradient o
Autor:
Lewis W. Flanagin, Michael D. Stewart, Gerard M. Schmid, Sean D. Burns, C. Grant Willson, Vivek K. Singh
Publikováno v:
Advances in Resist Technology and Processing XVII.
Computer simulation of microlithography is a valuable tool for both optimization of current processes and development of advanced techniques. The capability of a computer simulation is limited by the accuracy of the physical model for the process bei
Autor:
Adam R. Pawlowski, Pavlos C. Tsiartas, Christopher L. McAdams, C. Grant Willson, Lewis W. Flanagin, Clifford L. Henderson
Publikováno v:
SPIE Proceedings.
The differences in the dissolution behavior of novolac and poly(4-hydroxystyrene) (PHS) can be explained in terms of differences in the pKa of the two polymers. The proximity of the hydroxyl groups in ortho-ortho bonded novolac causes a large change