Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Lev Faivishevsky"'
Autor:
Adi Szeskin, Ravid Shwartz-Ziv, Lev Faivishevsky, Tahi Hollander, Benjamin Melloul, Amitai Armon, Tom Hope, Ronen Laperdon, Ashwin K. Muppalla, Itamar Ben Ari
Publikováno v:
KDD
We present a novel system for performing real-time detection of diverse visual corruptions in videos, for validating the quality of graphics units in our company. The system is used for several types of content, including movies and 3D graphics, with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::849adc70be3a2f898eec210dff8d744d
https://doi.org/10.1145/3447548.3467116
https://doi.org/10.1145/3447548.3467116
Autor:
Lev Faivishevsky
Publikováno v:
ICASSP
Internet of Things (IoT) is one of the main technological trends in the recent years. It allows machine-to-machine communication over the internet. Almost each device may transmit information from its sensors over the web to enable centralized insigh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::417b9f879ebd2439630e7d2034e31547
https://doi.org/10.1109/icassp.2016.7472879
https://doi.org/10.1109/icassp.2016.7472879
Autor:
Lev Faivishevsky, Jacob Goldberger
Publikováno v:
Neurocomputing. 80:31-37
In this paper we introduce a supervised linear dimensionality reduction algorithm which finds a projected input space that maximizes the mutual information between input and output values. The algorithm utilizes the recently introduced MeanNN estimat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::36f371e501b4e279b192d01deae422a7
https://doi.org/10.1016/j.neucom.2011.07.028
https://doi.org/10.1016/j.neucom.2011.07.028
Autor:
Lev Faivishevsky, Jacob Goldberger
Publikováno v:
Pattern Recognition Letters. 33:256-262
In this paper we propose a new unsupervised dimensionality reduction algorithm that looks for a projection that optimally preserves the clustering data structure of the original space. Formally we attempt to find a projection that maximizes the mutua
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1308330f4eddecdfeed142770fbddf8
https://doi.org/10.1016/j.patrec.2011.10.012
https://doi.org/10.1016/j.patrec.2011.10.012
Autor:
Jacob Goldberger, Lev Faivishevsky
Publikováno v:
MLSP
We present a novel filter approach to unsupervised feature selection based on the mutual information estimation between features. Our feature selection approach does not impose a parametric model on the data and no clustering structure is estimated.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::067f796a1ae9f55907a90bdaad8b8ee4
https://doi.org/10.1109/mlsp.2012.6349791
https://doi.org/10.1109/mlsp.2012.6349791
Autor:
Jacob Goldberger, Lev Faivishevsky
Publikováno v:
2010 IEEE International Workshop on Machine Learning for Signal Processing.
In this paper we introduce a supervised linear dimensionality reduction algorithm which is based on finding a projected input space that maximizes mutual information between input and output values. The algorithm utilizes the recently introduced Mean
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5693e7fe6450035fc2f5ac2d09a2f1a
https://doi.org/10.1109/mlsp.2010.5589176
https://doi.org/10.1109/mlsp.2010.5589176
Autor:
Wei-Guo Lei, Joan McCall, Rajesh Nagpal, Jun Kim, Vivek Balasubramanian, Mark Wagner, Udy Danino, Suheil J. Zaatri, Michael Ben-Yishai, Lev Faivishevsky, Tejas H. Shah, Shmoolik Mangan, Michael Penn, Oded Dassa, Aviram Tam
Publikováno v:
SPIE Proceedings.
Die-to-Model (D2M) inspection is an innovative approach to running inspection based on a mask design layout data. The D2M concept takes inspection from the traditional domain of mask pattern to the preferred domain of the wafer aerial image. To achie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43a2d0664643cf72e3b4d1e250d79f4a
https://doi.org/10.1117/12.829637
https://doi.org/10.1117/12.829637
Autor:
Netanel Polonsky, Ingrid Minaert Janssen, Marcel Demarteau, Onno Wissmans, Yaron Cohen, Ziv Parizat, Tal Verdene, Yair Elblinger, Shmoolik Mangan, Michael Ben Yishai, Jo Finders, Lev Faivishevsky, Frank Duray, Ilan Englard
Publikováno v:
SPIE Proceedings.
Scanner performance is influenced by the quality of its illumination, mechanical and optical elements and the impact of these factors on the printed wafer. Isolation of the aggregated scanner errors from other sources of error on the printed wafer is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8ab733bb05aeea33265c5893ff5e5d8
https://doi.org/10.1117/12.833467
https://doi.org/10.1117/12.833467
Publikováno v:
SPIE Proceedings.
Advanced immersion lithography is enabled by a combination of optimized off-axis illumination, highly complex design patterns, and photo-mask technologies with several transmission and phase levels. The pattern on the mask, for 45nm half pitch and be
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9c7206d07df75bc9c82240f2e79b31a
https://doi.org/10.1117/12.829635
https://doi.org/10.1117/12.829635
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
The difficulties encountered during lithography of state-of-the-art 2D patterns are formidable, and originate from the fact that deep sub-wavelength features are being printed. This results in a practical limit of k 1 ≥0.4 as well as a multitude of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f0f98fc767da5c0b8c84b093dd3d553
https://doi.org/10.1117/12.814282
https://doi.org/10.1117/12.814282