Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Lester Casoose"'
Autor:
Sidlgata V. Sreenivasan, Jin Choi, Kevin J. Nordquist, Lester Casoose, K. Gehoski, William J. Dauksher, Douglas J. Resnick, Ashuman Cherala
Publikováno v:
Microelectronic Engineering. :633-640
High-resolution overlay is considered to be an important challenge for imprint lithography processes. A key advantage of Step and Flash(TM) Imprint Lithography (S-FIL(TM)) is that it uses low-pressures (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c472c15a63e18452e3e7e3164960190
https://doi.org/10.1016/j.mee.2004.12.097
https://doi.org/10.1016/j.mee.2004.12.097
Autor:
Gerberich, William M.1, Jungk, John M.1, Li, Min1, Volinsky, Alex A.2, Hoehn, Joel W.3, Yoder, Karl4
Publikováno v:
International Journal of Fracture. Mar2003, Vol. 120 Issue 1/2, p387-405. 19p. 3 Black and White Photographs, 7 Diagrams, 4 Graphs.
Publikováno v:
International Journal of Fracture. Mar2003, Vol. 120 Issue 1/2, p431-439. 9p. 4 Black and White Photographs, 3 Diagrams.
Publikováno v:
Philosophical Magazine A. 11/20/2002, Vol. 82 Issue 17/18, p3383-3391. 9p.
Publikováno v:
EUV Lithography; 1/ 1/2008, Vol. PM178, p55-101, 47p
Autor:
Cardinale, G. F., Skinner, J. L., Talin, A. A., Brocato, R. W., Palmer, D. W., Mancini, D. P., Dauksher, W. J., Gehoski, K., Le, N., Nordquist, K. J., Resnick, D. J.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 6, p3265-3270, 6p
Autor:
Resnick, Douglas J., Mancini, D. P., Nordquist, K. J., Dauksher, W. J., McMackin, I., Schumaker, P., Thompson, E., Sreenivasan, S. V.
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Apr2004, Vol. 3 Issue 2, p316-321, 6p
Autor:
Nordquist, K. J., Ainley, E. S., Mancini, D. P., Dauksher, W. J., Gehoski, K. A., Baker, J., Resnick, D. J., Masnyj, Z., Mangat, P. J. S.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 2, p695-701, 7p
Autor:
Resnick, D. J., Dauksher, W. J., Mancini, D., Nordquist, K. J., Bailey, T. C., Johnson, S., Stacey, N., Ekerdt, J. G., Willson, C. G., Sreenivasan, S. V., Schumaker, N.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2003, Vol. 21 Issue 6, p2624-2631, 8p
Autor:
Dauksher, W. J., Mancini, D. P., Nordquist, K. J., Resnick, D. J., Standfast, D. L., Convey, D., Wei, Y.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2003, Vol. 21 Issue 6, p2771-2776, 6p