Etude des propriétés électro-optiques des couches minces de Ba1-xSrxTiO3 pour la modulation optique

Autor: Leroy, Floriane

Le développement de nouveaux matériaux est essentiel dans la réalisation de capteurs de petites dimensions et pour les composants micro-nano-optoélectroniques. Les matériaux à base d'oxydes en sont de bons candidats. Ce travail de thèse a conc

Externí odkaz: http://www.theses.fr/2012VALE0021/document

Advance in low-k cryogenic etching of porous organoscilicate : Investigation of a new gas with higher boiling point Organic (HBPO) and comparison with C4F8

Autor: Leroy, Floriane, Brochu, Nataniel, Chanson, Romain, Dussart, Remi, Tillocher, Thomas, De Marneffe, Jean-Francois, Zhang, Liping, Maekawa, Kaoru, Yatsuda, Koichi, Shigeru, Tahara, Dussarrat, Christian

Publikováno v: Plasma Etch and Strip in Microtechnology
Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::1e9493925b76a7f603bd1bcbd1a18a28
https://hal.archives-ouvertes.fr/hal-01344722

Reduction of plasma induced damage in cryogenic etching of low-k materials

Autor: Tillocher, Thomas, Leroy, Floriane, Zhang, Liping, Lefaucheux, Philippe, Dussarat, Christian, De Marneffe, Jean-Francois, Baklanov, Mikhail, Dussart, Remi

Publikováno v: 4th French Symposium on Emerging Technologies for micro-nanofabrication
4th French Symposium on Emerging Technologies for micro-nanofabrication, Nov 2015, Ecully, France

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::d3b30158700dcac186e0f1ed23bb757b
https://hal.archives-ouvertes.fr/hal-01277115

Surface state improvement in GaN deep etching for power electronics applications

Autor: Gosset, Nicolas, Leroy, Floriane, Tillocher, Thomas, Ladroue, Julien, Lefaucheux, Philippe, Boufnichel, Mohamed, Dussart, Remi

Publikováno v: 37th International Symposium on Dry Process (DPS 2015)
37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::ce6af4720032e1a6111aff7c9f25818a
https://hal.archives-ouvertes.fr/hal-01228470

Limitation of surface defects in deep GaN etching

Autor: Gosset, Nicolas, Tillocher, Thomas, Leroy, Floriane, Ladroue, Julien, Lefaucheux, Philippe, Boufnichel, Mohamed, Dussart, Remi

Publikováno v: AVS 62nd International Symposium & Exhibition
AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::348873996e6689a4c0bd4b46e7ee2944
https://hal.archives-ouvertes.fr/hal-01228462