Zobrazeno 1 - 10
of 30
pro vyhledávání: '"Lee Kammerdiner"'
Publikováno v:
Integrated Ferroelectrics. 66:171-178
Most applications of high-K paraelectrics involve microwave frequencies; tunable microwave filters and phase shifters are obvious examples. Applications such as power supply decoupling and some tunable microwave devices make use of discrete capacitor
Publikováno v:
Materials Letters. 57:4147-4150
Mg-doped Ba0.96Ca0.04Ti0.84Zr0.16O3 (BCTZ) thin films were fabricated on Pt/MgO substrate by metallorganic decomposition (MOD) method. The structures of these films were analyzed by X-ray diffraction. The electrical measurements were performed on met
Publikováno v:
Integrated Ferroelectrics. 58:1395-1402
In order to integrate a ferroelectric-based device into a larger circuit, one must create an equivalent circuit model for the device. Ferroelectric materials contain a number of complicated parameters that make this task far from trivial. In a Ba0.5S
Publikováno v:
Integrated Ferroelectrics. 58:1395-1402
Publikováno v:
Integrated Ferroelectrics. 53:413-420
Much of the interest in Ba0.5Sr0.5TiO3 (BST) thin films has focused on DRAM applications. For this application, the most studied characteristics have been the dielectric constant and the leakage current, both of which are usually measured either at D
Publikováno v:
Thin Solid Films. 402:307-310
In this work, the growth and study of dielectric properties of Ba0.7Sr0.3TiO3 (BST) thin films grown on thin Bi layer coated Pt(111)/Ti/SiO2/Si substrates, depending on thin Bi layer thickness is reported. The BST thin film (thickness 180 nm) grown o
Publikováno v:
Integrated Ferroelectrics. 38:289-295
High dielectric constant Ba0.96Ca0.04Ti0.84Zr0.16O3 (BCTZ) thin films were deposited on Pt/Ti/SiO2/Si substrates by spin on metal-organic decomposition (MOD) technique. Undoped and 0.4% Mg-doped BCTZ thin films were annealed in the temperature range
Publikováno v:
Applied Physics Letters. 84:771-773
Ba0.96Ca0.04Ti0.84Zr0.16O3 films acceptor doped with Sc were deposited on Pt/TiO2/SiO2/Si substrates using radio frequency magnetron sputtering. Substrate temperatures throughout the fabrication process remained at or below 450 °C, which allows this
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 11:1406-1410
Two ionized cluster beam (ICB) sources were used to deposit PbTiO3 films 300 nm thick onto Pt‐metallized, oxidized Si wafers 100 mm in diameter. Pb was deposited from one ICB source and Ti from the other. The deposition was carried out in a mixture
Publikováno v:
Applied Physics Letters. 78:3517-3519
Mg-doped Ba0.96Ca0.04Ti0.84Zr0.16O3 (BCTZ) thin films have been proposed as a promising material for microelectronic device applications based on high dielectric materials. Perovskite polycrystalline Mg-doped BCTZ thin films were fabricated on a Pt/T