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pro vyhledávání: '"Lee, Keehong"'
Autor:
Ntetsikas, K, Liontos, G, Avgeropoulos, A, Lee, Keehong, Kreider, Melissa E., Bai, Wubin, Cheng, Li-Chen, Dinachali, Saman Safari, Tu, Kun-Hua, Huang, Tao, Ross, Caroline A
Publikováno v:
IOP Publishing
The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od________88::7aad9f95998fb905c3e90d3e9aae21e8
https://orcid.org/0000-0001-9975-9903
https://orcid.org/0000-0001-9975-9903
Autor:
Ntetsikas, K, Liontos, G, Avgeropoulos, A, Lee, Keehong, Kreider, Melissa E., Bai, Wubin, Cheng, Li-Chen, Dinachali, Saman Safari, Tu, Kun-Hua, Huang, Tao, Ross, Caroline A
Publikováno v:
IOP Publishing
The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od________88::4100f437e537f5da0349bdaac49dd699
https://orcid.org/0000-0001-9975-9903
https://orcid.org/0000-0001-9975-9903
Akademický článek
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