Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Lawrence Ferreira"'
Publikováno v:
Journal of Photopolymer Science and Technology. 13:513-518
Polymers based on tertiary-butyl acrylate were synthesized with different compositions and glass transition temperature (Tg) values. These polymers are formulated identically and exposed under identical optical conditions. Lithographically, these pol
Autor:
Lawrence Ferreira, Toru Fujimori, Allyn Whewell, Veerle Van Driessche, Brian Maxwell, Kazuya Uenishi, Thomas R. Sarubbi, Yasumasa Kawabe, Toshiaki Aoai, Tadayoshi Kokubo, Andrew J. Blakeney, Murrae J. Bowden, Shiro Tan, Sanjay Malik
Publikováno v:
Journal of Photopolymer Science and Technology. 12:591-600
Physical and lithographic properties of structurally diverse acetal-derivatized hydroxy styrene polymers are reported. The dissolution and thermal properties of the acetal-blocked-polymers vary with the size of the pendent acetal moiety. The lithogra
Autor:
Thomas R. Sarubbi, Brian Maxwell, Joseph J. Sizensky, B. A. Blachowicz, Thomas Kocab, Sanjay Malik, Lawrence Ferreira, Murrae J. Bowden, Andrew J. Blakeney
Publikováno v:
Journal of Photopolymer Science and Technology. 11:431-438
Autor:
Thomas R. Sarubbi, Shiro Tan, Sanjay Malik, Brian Maxwell, Yasumasa Kawabe, Andrew J. Blakeney, Toru Fujimori, Lawrence Ferreira, Kazuya Uenishi, Tadayoshi Kokubo, Murrae J. Bowden, Allyn Whewell, Veerle Van Driessche, Toshiaki Aoai
Publikováno v:
SPIE Proceedings.
Lithographic properties of a variety of acetal-derivatized styrene based polymers are reported. The structural modifications in the polymers involve varying the size of the pendent acetal moiety. the lithographic performances of the resists containin
Publikováno v:
SPIE Proceedings.
Chemically amplified (CA) resist systems are known to be sensitive to contamination. Environmental contaminants such as airborne amines can result in T-topping. In addition, the undesired diffusion of photogenerated acid into unexposed areas can resu
Publikováno v:
SPIE Proceedings.
A new class of novolaks capable of self associating has been synthesized. The associating structures are resulted via extended network of hydrogen bonding. Softening temperatures of the associating novolaks are found to be 15 - 25 degree(s)C higher t
Autor:
Yasumasa Kawabe, Tadayoshi Kokubo, Lawrence Ferreira, Fumiyuki Nishiyama, Shinji Sakaguchi, Andrew J. Blakeney, Shiro Tan
Publikováno v:
SPIE Proceedings.
Effects of a dissolution promoter (DP) on the lithographic behavior of DNQ-novolac resists were investigated. The key structure/property relationships of the DP in relation to other parameters of the resist components were identified. In this work, w
Autor:
M. Fregeolle, Joseph J. Sizensky, Arturo N. Medina, Lawrence Ferreira, Medhat A. Toukhy, Sobhy Tadros, Andrew J. Blakeney
Publikováno v:
SPIE Proceedings.
A new class of diazonaphthoquinone (DNQ) photoactive compounds (PACs) based on the divanillin core is introduced in this paper. The general structure of these PAC backbones is shown in Formula 1. The divanillin structure possesses unique electronic c
Autor:
Lawrence Ferreira, Medhat A. Toukhy, Patricia Morra, Andrew J. Blakeney, Nicholas M. Reynolds
Publikováno v:
SPIE Proceedings.
Recent advances in computer hardware and software have provided the capability to simulate complex mixtures of compounds on a molecular level. These tools provide the potential for exploration of resist chemistry and mechanism on a molecular level wi
Publikováno v:
SPIE Proceedings.
Recent advances in computer hardware and software have provided the capability to simulate complex mixtures of compounds on a molecular level. These tools provide the potential for exploration of resist chemistry and mechanism on a molecular level wi