Zobrazeno 1 - 10
of 100
pro vyhledávání: '"Lausch, D."'
Publikováno v:
In Energy Procedia 2012 27:179-184
Publikováno v:
In Energy Procedia 2012 27:7-12
Publikováno v:
Journal of Applied Physics; 2/7/2016, Vol. 119 Issue 5, p1-6, 6p, 3 Color Photographs, 2 Graphs
35th European Photovoltaic Solar Energy Conference and Exhibition; 1060-1064
Solar energy has become increasingly economical, especially in recent years. Defects in solar systems can endanger this economic efficiency. In solar modules electric c
Solar energy has become increasingly economical, especially in recent years. Defects in solar systems can endanger this economic efficiency. In solar modules electric c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1574cb875dbff2406c3f2c64df1ea52b
35th European Photovoltaic Solar Energy Conference and Exhibition; 557-560
The Black-Si method is a promising alternative technique to reduce the reflection of c-Si solar cells. However, drawbacks of this technique are (I) the ion bombardment of
The Black-Si method is a promising alternative technique to reduce the reflection of c-Si solar cells. However, drawbacks of this technique are (I) the ion bombardment of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5acfdfc9a6b99d0f531b203c76c16c7
35th European Photovoltaic Solar Energy Conference and Exhibition; 686-689
The effect of the film structure of SiNx on the hydrogen evolution at elevated temperatures was investigated by an effusion measurement system at constant heat rate. Cont
The effect of the film structure of SiNx on the hydrogen evolution at elevated temperatures was investigated by an effusion measurement system at constant heat rate. Cont
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::adf4837e537b9b94007da3ca75f86cf3
35th European Photovoltaic Solar Energy Conference and Exhibition; 561-563
Plasma etching can be applied to silicon and its compounds used in solar technology. Plasma texturing of Si surface allows getting a moth-eye surface texture which has a
Plasma etching can be applied to silicon and its compounds used in solar technology. Plasma texturing of Si surface allows getting a moth-eye surface texture which has a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::adc568809046274409c98cb8a47b057e
Autor:
Altermatt, P., Xiong, Z., He, Q., Deng, W., Ye, F., Yang, Y., Chen, Y., Feng, Z., Verlinden, P.J., Liu, A., Macdonald, D.H., Luka, T., Lausch, D., Turek, M., Hagendorf, C., Wagner-Mohnsen, H., Schön, J., Kwapil, W., Frühauf, F., Breitenstein, O., Looney, E.E., Buonassisi, T., Needleman, D.B., Jackson, C.M., Arehart, A.R., Ringel, S.A., McIntosh, K.R., Abbott, M.D., Sudbury, B.A., Zuschlag, A.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______610::e9744629fd969d19bba314f8826d41bb
https://publica.fraunhofer.de/handle/publica/257785
https://publica.fraunhofer.de/handle/publica/257785
Autor:
Plakhotnyuk, M.M., Gaudig, M., Davidsen, R.S., Lindhard, J.M., Hirsch, J., Lausch, D., Schmidt, M.S., Stamate, E., Hansen, O.
Black silicon (bSi) is promising for integration into silicon solar cell fabrication flow due to its excellent light trapping and low reflectance, and a continuously improving passivation. However, intensive ion bombardment during the reactive ion et
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______610::e68731b716da99e8e27b074b5634afd8
https://publica.fraunhofer.de/handle/publica/251321
https://publica.fraunhofer.de/handle/publica/251321
33rd European Photovoltaic Solar Energy Conference and Exhibition; 978-982
Light-induced degradation (LID) is a well-known problem of industrial silicon solar cells and can lead to severe electrical performance loss through the formation of reco
Light-induced degradation (LID) is a well-known problem of industrial silicon solar cells and can lead to severe electrical performance loss through the formation of reco
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::373e7dbb87b7596f33cff8e22f2c9522