Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Laurent Schwaederlé"'
Publikováno v:
Plasma Processes and Polymers. 12:764-770
A molecular dynamics model is implemented in a way dedicated to simulate initial conditions close to microwave plasma deposition of thick single crystal diamond films. The sticking coefficient of CH 3 radical is obtained for (111) and (100) surface a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be9f4d2761f5e7a51f86b5f19a8d0cd4
https://doi.org/10.1002/ppap.201400223
https://doi.org/10.1002/ppap.201400223
Autor:
Evi Bultinck, Erik C. Neyts, Maxie Eckert, Ming Mao, Laurent Schwaederlé, Violeta Georgieva, Annemie Bogaerts
Publikováno v:
Plasma processes and polymers
In this paper, an overview is given of different modeling approaches used for describing gas discharge plasmas, as well as plasma-surface interactions. A fluid model is illustrated for describing the detailed plasma chemistry in capacitively coupled
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cf3623a87b3722ca144a907ca093d667
https://doi.org/10.1002/ppap.200800207
https://doi.org/10.1002/ppap.200800207
Publikováno v:
Plasma Sources Science and Technology. 15:790-796
We present experimental results of the spatial distribution of Ar and Ti optical emission and absorption lines in Ar?Ti plasma during sputtering of Ti. Measurements were performed in a dc magnetron reactor with movable planar magnetron using optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a071b6119305b183cfb4e2f895148c7
https://doi.org/10.1088/0963-0252/15/4/024
https://doi.org/10.1088/0963-0252/15/4/024
Autor:
Lawrence Overzet, Remi Dussart, Laurent Schwaederlé, N. Sadeghi, Mukesh Kulsreshath, Thierry Dufour, Philippe Lefaucheux
Publikováno v:
Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2013, 114, pp.3303. ⟨10.1063/1.4858418⟩
Journal of Applied Physics, American Institute of Physics, 2013, 114, pp.243303. ⟨10.1063/1.4858418⟩
Journal of Applied Physics, American Institute of Physics, 2013, 114 (24), pp.243303. ⟨10.1063/1.4858418⟩
Journal of Applied Physics, American Institute of Physics, 2013, 114, pp.3303. ⟨10.1063/1.4858418⟩
Journal of Applied Physics, American Institute of Physics, 2013, 114, pp.243303. ⟨10.1063/1.4858418⟩
Journal of Applied Physics, American Institute of Physics, 2013, 114 (24), pp.243303. ⟨10.1063/1.4858418⟩
International audience; Micro hollow cathode discharges (MHCD) were produced using 250 μm thick dielectric layer of alumina sandwiched between two nickel electrodes of 8 μm thickness. A through cavity at the center of the chip was formed by laser d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::90a28040601ddac85afbf1a990cb38af
https://hal.archives-ouvertes.fr/hal-01006012
https://hal.archives-ouvertes.fr/hal-01006012
Autor:
Mukesh Kulsreshath, Lawrence J. Overzet, Olivier Aubry, Remi Dussart, Julien Ladroue, Marion Woytasik, Laurent Schwaederlé, Guillaume Schelcher, Thomas Tillocher, Philippe Lefaucheux
Publikováno v:
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2012, 45, pp.285202. ⟨10.1088/0022-3727/45/28/285202⟩
Journal of Physics D: Applied Physics, IOP Publishing, 2012, 45, pp.285202. ⟨10.1088/0022-3727/45/28/285202⟩
In this paper we present the fabrication technology used to make micro-discharge ‘reactors’ on a silicon (Si) substrate. For the fabrication of these reactors we have used Si wafers with 4 inch diameter and standard cleanroom facilities. The fabr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a363ceab23865fb327d7a79f21a3cb31
https://hal.archives-ouvertes.fr/hal-00713105
https://hal.archives-ouvertes.fr/hal-00713105
Autor:
Mukesh Kulsreshath, Remi Dussart, Thomas Tillocher, Philippe Lefaucheux, Lawrence J. Overzet, Laurent Schwaederlé
Publikováno v:
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2012, 45, pp.065201. ⟨10.1088/0022-3727/45/6/065201⟩
Journal of Physics D: Applied Physics, IOP Publishing, 2012, 45, pp.065201. ⟨10.1088/0022-3727/45/6/065201⟩
The influence of geometrical and operating parameters on the electrical characteristics of dc microcavity discharges provides insight into their controlling physics. We present here results of such a study on silicon-based microcavity discharge devic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::69225ba64947774b00d8bc57e9669b26
https://hal.archives-ouvertes.fr/hal-00667649/file/Article.pdf
https://hal.archives-ouvertes.fr/hal-00667649/file/Article.pdf
Autor:
Evi Bultinck, Annemie Bogaerts, Ivan Kolev, Laurent Schwaederlé, G. Buyle, Diederik Depla, Koen Van Aeken
Publikováno v:
Journal of physics: D: applied physics
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2009, 42 (19), pp.194018. ⟨10.1088/0022-3727/42/19/194018⟩
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2009, 42 (19), pp.194018. ⟨10.1088/0022-3727/42/19/194018⟩
International audience; In this paper, some modelling approaches to describe direct current (dc) magnetron discharges developed in our research groups will be presented, including an analytical model, Monte Carlo simulations for the electrons and for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7cd51b040c2e15d75a6c586e1872b1ae
https://hdl.handle.net/10067/781680151162165141
https://hdl.handle.net/10067/781680151162165141