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pro vyhledávání: '"Laura Dues"'
Autor:
Laura Dues, Jeffrey H. Baker, D. J. Resnick, William J. Dauksher, Kathleen A. Gehoski, Ngoc V. Le
Publikováno v:
SPIE Proceedings.
Along with other Next Generation Lithography (NGL) methods, imprint lithography has been included on the International Roadmap for Semiconductors (ITRS) for the 32 nm node, predicted to be production-ready by 20131. Step and Flash Imprint Lithography
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ba8da0a3d23e891a2df8ad9289382ba
https://doi.org/10.1117/12.605932
https://doi.org/10.1117/12.605932
Publikováno v:
Frontiers in Human Neuroscience, Vol 13 (2019)
To become acquainted with large-scale environments such as cities people combine direct experience and indirect sources such as maps. To ascertain which type of spatial knowledge is acquired by which source is difficult to evaluate. Using virtual rea
Externí odkaz:
https://doaj.org/article/dd89ec2400294842a9fd5fcad2dc1f21