Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Lau Kien Mun"'
Autor:
Awad, Yousef, Lavallee, Eric, Beauvais, Jacques, Drouin, D., Lau Kien Mun, Yang, Pan, Cloutier, M., Turcotte, David
Publikováno v:
In Thin Solid Films 2007 515(5):3040-3045
Autor:
David Turcotte, Lau Kien Mun, Yousef Awad, Eric Lavallee, Pan Yang, D. Drouin, Melanie Cloutier, Jacques Beauvais
Publikováno v:
Thin Solid Films. 515:3040-3045
The effects of various pulse reversal plating parameters on the grain size and smoothness of Ni film on silver seed layers has been studied. The duty cycle, frequency, bath temperature and agitation methods have been tested. The objective was to form
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a4042eb8e9caba180608d54517c39870
https://doi.org/10.1016/j.tsf.2006.08.016
https://doi.org/10.1016/j.tsf.2006.08.016
Publikováno v:
Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada. 10(6)
A major issue in low voltage lithography is surface charging, which results in beam deflection presented as uneven exposure between adjacent structures. In this study, charge-induced pattern distortions in low-voltage energy beam lithography (LVEBL)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2cfbd4a4577eb9f085694ddd2b4fc65e
https://pubmed.ncbi.nlm.nih.gov/19780323
https://pubmed.ncbi.nlm.nih.gov/19780323
Publikováno v:
Microscopy and Microanalysis. 11
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::10243fd3a75b3e2eadaf65a8b4dd0107
https://doi.org/10.1017/s1431927605510043
https://doi.org/10.1017/s1431927605510043
Autor:
Eric Lavallee, Hiroshi Nozue, Yousef Awad, Pan Yang, David Turcotte, Lau Kien Mun, Pierre Lafrance, R. Legario, Akira Yoshida, Melanie Cloutier, Jacques Beauvais, Dominique Drouin
Publikováno v:
SPIE Proceedings.
Masks for low energy electron proximity projection lithography (LEEPL) require thin membranes, which in turn make the development of low-distortion masks a critical issue for this technology. By using an evaporated resist, a flip side fabrication pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6be2c2f0e913d17c358e07e2a243a6df
https://doi.org/10.1117/12.535747
https://doi.org/10.1117/12.535747
Evaporated electron beam sensitive organic resist for the back-patterning of X-ray lithography masks
Autor:
Yousef Awad, Lau Kien Mun, Mark L. Schattenburg, J. M. Carter, M.H. Lim, M. Cloutier, D. Drouin, Henry I. Smith, E. Lavallee, J. Beauvais
Publikováno v:
2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers..
One of the most important issue in the choice of a next generation lithography technology is the availability of adequate mask fabrication technology to demonstrate the extendibility of the technology to future technology nodes. In the case of X-ray
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a9b4283e8990b460204ea594e5410d3
https://doi.org/10.1109/imnc.2002.1178672
https://doi.org/10.1109/imnc.2002.1178672
Autor:
Lau, Kien Mun.
This project aims to fabricate and compare the electrical and optical performance of InP-PIN diodes with a newly proposed novel SSO (Schottky-Semiconductor-Ohmic) photodiodes. Master of Engineering
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______1392::4af4975f73458f9b1c8a096ddb0ae532
http://hdl.handle.net/10356/4560
http://hdl.handle.net/10356/4560
Publikováno v:
Proceedings of SPIE; Nov2006, Issue 1, p615348-615348-8, 8p
Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist.
Autor:
Beauvais, Jacques, Lavallee, Eric, Zanzal, Andrew, Drouin, Dominique, Lau, Kien Mun, Veres, Teodor, Cui, Bo
Publikováno v:
Proceedings of SPIE; Nov2005, Issue 1, p392-399, 8p
Autor:
Prasad Kelkar, Pan Yang, Lau Kien Mun, Eric Lavallee, Jacques Beauvais, Dominique Drouin, R. Legario, Yousef Awad, Melanie Cloutier, Vincent Aimez, David Turcotte
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:743
Semiconductor micro and nanofabrication lithography techniques for application in microelectronics as well as in micromechanics and optoelectronics can gain significantly from using a dry resist process, since it enables the deposition of a very unif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75c47ac1196eb24c58b0f78045387a50
https://doi.org/10.1116/1.1667503
https://doi.org/10.1116/1.1667503