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pro vyhledávání: '"Latifa Desvoivres"'
Autor:
B. Le-Gratiet, R. Bouyssou, B. Orlando, Alice Pelletier, Céline Lapeyre, Latifa Desvoivres, Alain Ostrovsky, J. Ducote, Jean Damien Chapon, Auguste Lam, Anna Szucs, Nicolas Chojnowski, Vincent Farys, Onintza Ros Bengoechea, J. Decaunes, Jean-Christophe Michel, Vincent Morin, C. Monget, Marc Mikolajczak, Frank Sundermann, Maxime Gatefait, Pascal Gouraud, Laurene Babaud, Jonathan Planchot, Emek Yesilada
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 14:021103
Patterning process control has undergone major evolutions over the last few years. Critical dimension, focus, and overlay control require deep insight into process-variability understanding to be properly apprehended. Process setup is a complex engin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7ea7b96196431f517be1d881d144500
https://doi.org/10.1117/1.jmm.14.2.021103
https://doi.org/10.1117/1.jmm.14.2.021103
