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We report on advanced defect classification using TNO's RapidNano particle scanner. RapidNano was originally designed for defect detection on blank substrates. In detection-mode, the RapidNano signal from nine azimuth angles is added for sensitivity.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dris___00893::afdfc91e37b318b8b56b6fea88944513
http://resolver.tudelft.nl/uuid:dd0458f2-c461-4f88-8321-3c7bd6c86ec2
http://resolver.tudelft.nl/uuid:dd0458f2-c461-4f88-8321-3c7bd6c86ec2
Autor:
van der Walle, P, Kramer, E., van der Donck, J.C.J., Mulckhuyse, W, Nijsten, L., Bernal Arango, F.A., de Jong, A., van Zeijl, E., Spruit, H. E.T., van den Berg, J.H., Nanda, G., van Langen-Suurling, A.K., Alkemade, P.F.A., Pereira, S.F., Maas, D.J., Lehmann, Peter, Osten, Wolfgang, Albertazzi Gonçalves, Armando
Publikováno v:
SPIE Optical Metrology 2017, Munich, Germany, 26–29 June 2017
Optical Measurement Systems for Industrial Inspection X
Optical Measurement Systems for Industrial Inspection X
Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect clas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4667ef0f3c3b05754d5c90931832f604
http://resolver.tudelft.nl/uuid:1ceeadc1-22fe-495b-9042-a6361b6543bc
http://resolver.tudelft.nl/uuid:1ceeadc1-22fe-495b-9042-a6361b6543bc
Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect clas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dris___00893::cc274497e9aeb82272d88022d830ed82
http://resolver.tudelft.nl/uuid:1ceeadc1-22fe-495b-9042-a6361b6543bc
http://resolver.tudelft.nl/uuid:1ceeadc1-22fe-495b-9042-a6361b6543bc
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Conference
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