Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Lars Vestling"'
Publikováno v:
Solid-State Electronics. 115:179-184
A new latch-free LIGBT on SOI is presented. The new device combines advantages from both LDMOS as well as LIGBT technologies; high breakdown voltage, high drive current density, low control voltages, at the same time eliminating latch-up problems. Th
Publikováno v:
Solid-State Electronics. 97:59-65
Single- and polycrystalline silicon carbide (6H-SiC/poly-SiC) substrates were investigated regarding RF losses and crosstalk for their use in Si/SiC hybrid substrates. Such hybrid substrates would ...
Publikováno v:
IEEE Transactions on Electron Devices. 56:505-511
Small-signal and computational load-pull simulations are used to investigate the effect of substrate resistivity on efficiency in high-power operation of high-frequency silicon-on-insulator-LDMOS transistors. Identical transistors are studied on subs
Publikováno v:
Solid-State Electronics. 53:86-94
In this paper a method for TCAD evaluation of RF-power transistors in highefficiency operation using harmonic loading is presented. The method is based on large signal timedomaincomputational load-pull. Active loads are used in the harmonic load-pull
Publikováno v:
Sensors and Actuators B: Chemical. 123:27-34
This paper investigates a novel quartz crystal microbalance (QCM) biosensor with a small and rectangular flow cell along with a correspondingly shaped crystal electrode. The sensor was evaluated ...
Publikováno v:
EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon.
A new latch-free LIGBT on SOI is presented. The new device combines advantages from both LDMOS as well as LIGBT technologies; high breakdown voltage, high drive current density, low control voltages, at the same time eliminating latch-up problems. Br
Publikováno v:
Solid-State Electronics. 48:789-797
High frequency substrate losses for RF MOSFETs are analyzed using numerical device simulation. The results show that losses in devices made on low resistivity substrate occur through the substrate while losses in devices made on high resistivity subs
Autor:
Tadeusz Gruszecki, H. Pettersson, M Andersson, Anders Hagfeldt, Lars Vestling, Gunaraja Thuraisingham, Robert Thunman, Mårten O. M. Edwards
Publikováno v:
Journal of Electroanalytical Chemistry. 565:175-184
The charge-discharge kinetics of electrochromic displays, based on porous nanostructured viologen-derivatized TiO2 films, were investigated by std. electrochem. techniques. Various display compns. and geometries were studied. Chronocoulometry data we
Modeling and characterization of capacitive coupling in trench-isolated structures on SOI substrates
Publikováno v:
Solid-State Electronics. 48:43-49
Trench isolation and SOI substrates have made is possible to integrated high voltage devices together with low voltage circuitry, due to the total galvanic isolation. However, the trenches and the buried oxide of the SOI substrate do affect the total
Publikováno v:
Microelectronic Engineering. 65:428-438
In this study a possible approach for improving breakdown voltage while maintaining fT for a MOSFET, is presented. In a conventional MOSFET process with LDD the S/D is implanted with a large tilt angle, which gives an asymmetry due to the shadowing e