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Autor:
Henk-Jan H. Smilde, J. Ducote, Florent Dettoni, Yoann Blancquaert, Lars H. D. Driessen, Jerome Depre, Willy van Buel, Christophe Dezauzier, Jan Beltman, Richard Johannes Franciscus Van Haren
Publikováno v:
SPIE Proceedings.
Scatterometry mark design for improvement of the metrology performance is investigated in this joint work by ASML and STMicroelectronics. The studied marks are small, enabling metrology within the device area. The new mark-design approach reduces the