Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Larry Martinez"'
Autor:
Liana Bernard, Stefanie Fox, Kay Kulason, Alex Phanphackdy, Xander Kahle, Larry Martinez, Ludmila Praslova, Nicholas A. Smith
Publikováno v:
Industrial and Organizational Psychology. 16:50-54
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e465feddc7d65471c4cf4b35bf9d2ed9
https://doi.org/10.1017/iop.2022.100
https://doi.org/10.1017/iop.2022.100
Autor:
Lauren Park, Larry Martinez
Publikováno v:
Journal of Organizational Behavior. 43:1103-1120
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b51c0fba2ec0f8e4c72bf582f435f0cb
https://doi.org/10.1002/job.2626
https://doi.org/10.1002/job.2626
Publikováno v:
Journal of Managerial Psychology. 37:243-263
PurposeIncivility is pervasive in organisational settings, particularly in healthcare, and is associated with negative employee outcomes. The aim of this study was to analyse the relationships between experienced incivility, sleep quality and emotion
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f487654057de9600f812049ec74938f
https://doi.org/10.1108/jmp-03-2021-0194
https://doi.org/10.1108/jmp-03-2021-0194
Publikováno v:
Cornell Hospitality Quarterly. :193896552211272
With the increasingly diverse workforce in the hospitality and tourism industry, it is imperative to identify strategies to reduce biases in the workplace. Across two studies, we examined the utility of providing individual-level positive individuati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e94d362cae210d5adcdcc01e7b1c65a
https://doi.org/10.1177/19389655221127263
https://doi.org/10.1177/19389655221127263
This study evaluated the effect of paliperidone palmitate long-acting injectable (LAI) antipsychotic on recovery-oriented mental health outcomes from the perspective of healthcare providers and patients during the treatment of patients with schizophr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3bdb2d3245f1fe57da8c837dff46433c
Autor:
Paula L. Hoffman, Laura Saba, L D. Snell, Maurice Dongier, Igor Goncharov, Alan Kaiser, Lucie Legault, Masami Yoshimura, Sergey P. Pronko, Lisa M. Hines, Boris Tabakoff, Larry Martinez, Bridget F. Grant, Sanjiv V. Bhave
Major depression represents a complex mental disorder. The identification of biological markers that define subtypes of major depressive disorder would greatly facilitate appropriate medical treatments, as well as provide insight into etiology. Reduc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6e4261af57f324096709dd87c018543b
https://europepmc.org/articles/PMC6674903/
https://europepmc.org/articles/PMC6674903/
Autor:
Larry Martinez, Kent G. Green, Mary T. Zawadzki, Yonghong Yang, Prakash Krishnan, Peter D. Buck, Dianna Coburn, Curt Jackson, Dongsung Hong
Publikováno v:
SPIE Proceedings.
One of Cypress’ primary goals for 90-nm generation mask strategy is to control mask costs while not compromising on performance. One key objective is to replace the use of 50-ke V electron beam pattern generation with DUV laser mask lithography whe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7eb899223c2e184374c722e74001b654
https://doi.org/10.1117/12.535882
https://doi.org/10.1117/12.535882
Autor:
Curt Jackson, Kent G. Green, Shengqi Xie, Larry Martinez, Dongsung Hong, Peter D. Buck, Joshua Broussard, Bradley A. Ferguson, Prakash Krishnan, Nazneen Jeewakhan, Dianna Coburn
Publikováno v:
SPIE Proceedings.
Mask CD resolution and uniformity requirements for back end of line (BEOL) layers for the 90nm Technology Node push the capability of I-line mask writers; yet, do not require the capability offered by more expensive 50KeV ebeam mask writers. This sui
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4389cbab16b90c20b4376e89a93460af
https://doi.org/10.1117/12.518051
https://doi.org/10.1117/12.518051
Publikováno v:
2006 IEEE Radiation Effects Data Workshop; 2006, p191-194, 4p
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 21:518-520
Implant processes in a modern wafer production fab are extremely complex. There can be several types of misprocessing, i.e. wrong dose or species, double implants and missed implants. Process Control Terminals (PCT) for Varian 350Ds installed at Inte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f26d07493e67d3fa164a1b57b99c45fe
https://doi.org/10.1016/0168-583x(87)90894-9
https://doi.org/10.1016/0168-583x(87)90894-9