Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography

Autor: Hyun-su Kim, Wei Li, Mario C. Marconi, William S. Brocklesby, Larissa Juschkin

Publikováno v: IEEE Photonics Journal, Vol 8, Iss 3, Pp 1-9 (2016)

Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a periodic structure. The self-imaging effect (or Talbot effect) replicates the field intensity at a periodic mask in certain planes, effectively producing

Externí odkaz: https://doaj.org/article/c55ee633f37242c8822149c88027ceee

Characterisation of engineered defects in extreme ultraviolet mirror substrates using lab-scale extreme ultraviolet reflection ptychography

Autor: Haoyan Lu, Michal Odstrčil, Charles Pooley, Jan Biller, Mikheil Mebonia, Guanze He, Matthew Praeger, Larissa Juschkin, Jeremy Frey, William Brocklesby

Ptychography is a lensless imaging technique that is aberration-free and capable of imaging both the amplitude and the phase of radiation reflected or transmitted from an object using iterative algorithms. Working with extreme ultraviolet (EUV) light

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cd2b08903e6c02109e7aa211a54111c5
https://eprints.soton.ac.uk/476707/

Integrated simulations of hybrid discharge-laser produced plasma devices for EUV metrology

Autor: Valeryi A. Sizyuk, Ahmed Hassanein, Florian Melsheimer, Larissa Juschkin, Tatyana Sizyuk

Publikováno v: Optical and EUV Nanolithography XXXV.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bced413003601e75a0de8d484d10a9df
https://doi.org/10.1117/12.2614327

Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization

Autor: Sven Glabisch, Larissa Juschkin, Sophia Schroeder, Peter Loosen, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Lukas Bahrenberg, Moein Ghafoori

Publikováno v: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

The authors present a novel approach for the structural characterization of periodic nanostructures using spectrally resolved broadband scatterometry in the extreme ultraviolet (EUV) wavelength range. The implemented metrology method combines 0th and

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::fca1d738c0c466d4beb1a79e527e5313
https://doi.org/10.1117/12.2584738

Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry

Autor: Serhiy Danylyuk, Maksym Tryus, Jürgen Schubert, Piergiorgio Nicolosi, Lidia Kibkalo, Igor Alexandrovich Makhotkin, Angelo Giglia, Larissa Juschkin, Konstantin Nikolaev

Publikováno v: Thin solid films, 680, 94-101. Elsevier
Thin solid films
680 (2019): 94–101. doi:10.1016/j.tsf.2019.04.037
info:cnr-pdr/source/autori:Tryus M.; Nikolaev K.V.; Makhotkin I.A.; Schubert J.; Kibkalo L.; Danylyuk S.; Giglia A.; Nicolosi P.; Juschkin L./titolo:Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry/doi:10.1016%2Fj.tsf.2019.04.037/rivista:Thin solid films (Print)/anno:2019/pagina_da:94/pagina_a:101/intervallo_pagine:94–101/volume:680

A thin orthorhombic LaLuO3 film, grown on SrTiO3 substrate by pulsed laser deposition, is characterized using multi-angle spectral extreme ultraviolet reflectometry (EUVR). Layer structure parameters and optical constants of LaLuO3 are determined sim

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::89615fbbf6d8ce8310f2129c8fa3e31a
https://research.utwente.nl/en/publications/444efc6b-cdc5-4308-8b9a-9fc4a6164aff