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The Electrical and Optical Properties of Al-Doped ZnO Thin Films Prepared by Atomic Layer Deposition
Publikováno v:
Advanced Materials Research. :1402-1405
Al-doped ZnO (AZO) thin films (~100nm) with low electrical resistivity and high transparency have been prepared by atomic layer deposition on glass and Si(111) substrates at 200 °C with different doping sequence. The films were systematically analyz
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ba1a01adb7509ecbd56f41f355cdb72
https://doi.org/10.4028/www.scientific.net/amr.306-307.1402
https://doi.org/10.4028/www.scientific.net/amr.306-307.1402
