Zobrazeno 1 - 10
of 18
pro vyhledávání: '"L.C. Phinney"'
Autor:
Linda Höglund, Gary W. Wicks, Arezou Khoshakhlagh, Terry Golding, Khalid Hossain, David Z. Ting, Sarath D. Gunapala, A. Soibel, L.C. Phinney
Publikováno v:
Journal of Electronic Materials. 45:5626-5629
Two hydrogenation techniques were used to passivate defects in InAs/InAsSb superlattices: UV-photon assisted hydrogenation with and without DC bias enhancement. The effects of the hydrogenation on the minority carrier lifetime were studied using phot
Autor:
Khalid Hossain, Chintalapalle V. Ramana, O.R. Nunez, A.J. Moreno Tarango, L.C. Phinney, Neil R. Murphy
Publikováno v:
Thin Solid Films. 596:160-166
Tungsten oxynitride (W–O–N) thin films were deposited onto silicon (100) and quartz substrates using direct current (DC) sputtering. Composition variations in the W–O–N films were obtained by varying the nitrogen gas flow rate from 0 to 20 sc
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 332:286-289
The dependences of the total sputtering yield of Bi and the differential angular distribution of these sputtered Bi atoms on the fluence of 50 keV Ar + ions at normal incidence have been experimentally measured. Polycrystalline Bi targets were used f
Autor:
Khalid Hossain, Floyd D. McDaniel, L.J. Mitchell, E.B. Smith, P. Paudel, F.U. Naab, O.W. Holland, L.C. Phinney, Jerome L. Duggan, Mangal Dhoubhadel
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 261:669-673
An initial study was performed on the feasibility of forming Ru 2 Si 3 nanocrystals using an implantation and oxidation technique. Silicon (1 0 0) was implanted with Ru − ions at a fluence of 1.0 × 10 17 atoms/cm 2 at an energy of 45 keV. The impl
Autor:
P.R. Poudel, Duncan L. Weathers, Floyd D. McDaniel, L.R. Burns, L.C. Phinney, L.J. Mitchell, Khalid Hossain, Jerome L. Duggan, E.B. Smith
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 261:627-629
An MeV energy beam line for ion implantation of carbon and silicon to fashion optically-active nanocrystals has been constructed at the Ion Beam Modification and Analysis Laboratory at the University of North Texas (UNT). The implantation line is at
Autor:
Tetsuya Mishima, Khalid Hossain, Mukul C. Debnath, L.C. Phinney, Michael B. Santos, Terry Golding
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 32:02C116
InSb epilayers and InSb/Al0.20In0.80Sb quantum wells (QWs) were grown on 4°-off-axis Ge-on-insulator (GeOI) substrates by molecular beam epitaxy. An initial AlSb nucleation was found to be important for achieving good crystalline quality. For a 4.0-
Autor:
Jerome L. Duggan, L.C. Phinney, F U Naab, Duncan L. Weathers, Gregory Lapicki, Floyd D. McDaniel
Publikováno v:
Journal of Physics B: Atomic, Molecular and Optical Physics. 45:035205
The M-shell x-ray production cross sections for thorium and uranium have been measured for carbon ions with energies from 4.5 to 11.3 MeV with the charge state q increasing from 2 to 4, and oxygen ions with energies from 4.5 to 13.5 MeV with the char
Publikováno v:
Journal of Physics B: Atomic, Molecular and Optical Physics. 42:085202
M-shell x-ray production cross sections for thorium and uranium have been determined for protons of energies 0.4–4.0 MeV and helium ions of energies 0.4–6.0 MeV. The M-shell line and total M-shell x-ray production cross sections are compared to t
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Akademický článek
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