Zobrazeno 1 - 3
of 3
pro vyhledávání: '"L. S. WieluŃski"'
Publikováno v:
Thin Solid Films. 104:235-242
We investigated the redistribution of oxygen after a thermally induced reaction of an evaporated chromium film deposited on an Si substrate. To monitor the redistribution, 18O was implanted in the metal film or in the silicon substrate. Depth profile
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f1882914541e7659ac3fdc42f1fc974e
https://doi.org/10.1016/s0040-6090(83)80002-9
https://doi.org/10.1016/s0040-6090(83)80002-9
Publikováno v:
Journal of Vacuum Science and Technology. 20:182-185
A significant improvement of the lateral uniformity of thermally formed Ni_(2)Si layers has been observed after low‐dose (10^(13)~3 × 10^(14) ion/cm^2) Xe irradiation of an As‐deposited Ni film. Measurements have also been made on samples that c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8637b3a90f358bc11640c97f102e461b
https://doi.org/10.1116/1.571353
https://doi.org/10.1116/1.571353
Publikováno v:
MRS Proceedings. 18
In the present study we investigate the influence of nitrogen on the silicide formation of thin nickel and platinum films. Nitrogen is introduced by implantation either in the metal films or in the silicon substrates. We use the rare stable isotope 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c77a7b6b612a8fefbfe8131927efa296
https://doi.org/10.1557/proc-18-243
https://doi.org/10.1557/proc-18-243